⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1880050 | 0.94 | CA12 (0.44) | — | |
| SCHEMBL2058229 | 0.91 | DNM1 (0.46) | — | |
| SCHEMBL4481993 | 0.88 | DNM1 (0.50) | — | |
| SCHEMBL9580812 | 0.88 | DNM1 (0.50) | — | |
| SCHEMBL4886759 | 0.88 | DNM1 (0.50) | — | |
| SCHEMBL2058618 | 0.88 | DNM1 (0.50) | — | |
| SCHEMBL2058482 | 0.88 | — | — | |
| SCHEMBL2058575 | 0.88 | DNM1 (0.50) | — | |
| SCHEMBL9397584 | 0.88 | DNM1 (0.50) | — | |
| SCHEMBL7964014 | 0.88 | CA12 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119736815-B | Cationic polyurethane wet strength agent for papermaking and preparation method thereof | 浙江九本环保技术有限公司 | 2025-05-09 | — | — | CN | claimed |
| CN-119736815-A | Cationic polyurethane wet strength agent for papermaking and preparation method thereof | 浙江九本环保技术有限公司 | 2025-04-01 | — | — | CN | claimed |
| CN-105153905-B | A kind of preparation method and applications of graphene modified polyurethane film forming agent | 泰山玻璃纤维有限公司 | 2017-12-01 | — | — | CN | claimed |
| US-7968507-B2 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-06-28 | — | — | US | claimed |
| US-20090084406-A1 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. | 2009-04-02 | — | — | US | claimed |
| US-20080066644-A1 | Alkylmines, alkanolamine compounds, surfactants, a coloring agent and a solvent; combination results in decreased kogation | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-03-20 | — | — | US | claimed |
| EP-1900785-A1 | Ink Composition for Inkjet Recording | Samsung Electronics Co., Ltd. (KR) | 2008-03-19 | — | — | EP | claimed |
| CN-119736815-B | Cationic polyurethane wet strength agent for papermaking and preparation method thereof | 浙江九本环保技术有限公司 | 2025-05-09 | — | — | CN | disclosed |
| CN-119736815-A | Cationic polyurethane wet strength agent for papermaking and preparation method thereof | 浙江九本环保技术有限公司 | 2025-04-01 | — | — | CN | disclosed |
| EP-3518874-B1 | METHODS, COMPOSITIONS AND USES RELATING THERETO | INNOSPEC LTD (GB) | 2023-08-16 | — | — | EP | disclosed |
| WO-2023131780-A1 | CORROSION INHIBITOR | INNOSPEC LIMITED (GB) | 2023-07-13 | — | — | WO | disclosed |
| US-11311471-B2 | Methods, compositions and uses relating thereto | INNOSPEC LIMITED (GB) | 2022-04-26 | — | — | US | disclosed |
| US-11253453-B2 | Reducing colour loss from a dyed material by using an amine salt of a carboxylic acid | INNOSPEC LIMITED (GB) | 2022-02-22 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1068959-A1 | WATER RESISTANCE IMPROVING AGENT FOR INKJET RECORDING PAPER AND INKJET RECORDING PAPER | Nicca Chemical Co., Ltd. (JP) | 2001-01-17 | — | — | EP | disclosed |
| EP-1031884-A2 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-08-30 | — | — | EP | disclosed |