Known targets — ChEMBL curated mechanism
ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4
The experimentally established mechanism targets of Nonane. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.89 |
| ▸ | THRB | P10828 | 1/20 | 0.89 |
| ▸ | DNM1 | Q05193 | 7/20 | 0.64 |
| ▸ | LMNA | P02545 | 3/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.57 |
| ▸ | MEN1 | O00255 | 2/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.57 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.57 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.57 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Decane SCHEMBL8345709 | 1.00 | TSHR (0.89) | TSHRTHRBDNM1LMNAALDH1A1 | |
| Heptane SCHEMBL2316247 | 1.00 | — | — | |
| Dodecane SCHEMBL3296654 | 1.00 | TSHR (0.89) | TSHRTHRBDNM1LMNAALDH1A1 | |
| Octane SCHEMBL9775420 | 1.00 | TSHR (0.89) | TSHRTHRBDNM1LMNAALDH1A1 | |
| Nonane SCHEMBL9775414 | 1.00 | TSHR (0.89) | TSHRTHRBDNM1LMNAALDH1A1 | |
| Decane SCHEMBL7127175 | 1.00 | TSHR (0.89) | TSHRTHRBDNM1LMNAALDH1A1 | |
| Tetradecane SCHEMBL25287499 | 1.00 | TSHR (0.89) | TSHRTHRBDNM1LMNAALDH1A1 | |
| Hexadecane SCHEMBL22470776 | 1.00 | TSHR (0.89) | TSHRTHRBDNM1LMNAALDH1A1 | |
| Decane SCHEMBL22470775 | 1.00 | TSHR (0.89) | TSHRTHRBDNM1LMNAALDH1A1 | |
| Decane SCHEMBL6294371 | 1.00 | TSHR (0.89) | TSHRTHRBDNM1LMNAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106103639-A | Composition for tungsten cmp | 嘉柏微电子材料股份公司 | 2016-11-09 | — | — | CN | claimed |
| CN-106103638-A | Composition for tungsten CMP | 嘉柏微电子材料股份公司 | 2016-11-09 | — | — | CN | claimed |
| CN-114127211-B | Method for improving barrier film removal rate in bulk tungsten slurry | CMC材料有限责任公司 | 2024-06-25 | — | — | CN | disclosed |
| CN-117025100-A | Slurry of processed tungsten with cationic surfactant | CMC材料股份有限公司 | 2023-11-10 | — | — | CN | disclosed |
| CN-108473849-B | Slurry of processed tungsten with catalyst | CMC材料股份有限公司 | 2023-07-21 | — | — | CN | disclosed |
| CN-114127211-A | Method for increasing barrier film removal rate in bulk tungsten slurry | CMC材料股份有限公司 | 2022-03-01 | — | — | CN | disclosed |
| CN-110317201-B | Asymmetric synthesis method of (S, S) -2, 8-diazabicyclo [4,3,0] nonane | 武汉理工大学 | 2022-03-01 | — | — | CN | disclosed |
| CN-106104763-B | Composition for tungsten chemical mechanical polishing | 嘉柏微电子材料股份公司 | 2020-07-21 | — | — | CN | disclosed |
| CN-110317201-A | The method of asymmetric synthesis of (S, S) -2,8- diazabicyclo [4,3,0] nonane | 武汉理工大学 | 2019-10-11 | — | — | CN | disclosed |
| CN-106415796-B | Mixed abrasive tungsten chemical mechanical polishing composition | 嘉柏微电子材料股份公司 | 2019-06-25 | — | — | CN | disclosed |
| CN-106103639-B | Composition for tungsten CMP | 嘉柏微电子材料股份公司 | 2019-06-18 | — | — | CN | disclosed |
| CN-106133881-A | Composition for tungsten polishing | 嘉柏微电子材料股份公司 | 2016-11-16 | — | — | CN | disclosed |
| CN-106103638-A | Composition for tungsten CMP | 嘉柏微电子材料股份公司 | 2016-11-09 | — | — | CN | disclosed |
| CN-106104763-A | Composition for tungsten chemical mechanical polishing | 嘉柏微电子材料股份公司 | 2016-11-09 | — | — | CN | disclosed |
| CN-106103639-A | Composition for tungsten cmp | 嘉柏微电子材料股份公司 | 2016-11-09 | — | — | CN | disclosed |
| CN-1075499-C | Quinolone-and naphthyridonecarboxylic acid derivatives | BAYER AG (DE) | 2001-11-28 | — | — | CN | disclosed |
| CN-1043142-C | Quinolone-and naphthyridonecarboxylic acid derivatives, their preparation and use | BAYER AG (DE) | 1999-04-28 | — | — | CN | disclosed |
| US-5027157-A | Developing device provided with electrodes for inducing a traveling wave on the developing material | MINOLTA CAMERA KABUSHIKI KAISHA (JP) | 1991-06-25 | — | — | US | disclosed |
| US-4867541-A | FILM FORMED BY PLASMA POLYMERIZATION OF PHTHALOCYANINE COMPOUND | MINOLTA CAMERA KABUSHIKI KAISHA (JP) | 1989-09-19 | — | — | US | disclosed |
| US-4828369-A | ELECTROLYTES, PLASMA POLYMERIZATION OF HYDROCARBON, ALKALI METAL /COMPOUND/, ELECTRONEGATIVITY | MINOLTA CAMERA KABUSHIKI KAISHA (JP) | 1989-05-09 | — | — | US | disclosed |