SCHEMBL9775778

SCHEMBL9775778

CC(=O)c1ccc(OC(=O)OC(C)([Si](C)(C)C)[Si](C)(C)C)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.56
MAPT P10636 4/20 0.48
RAB9A P51151 2/20 0.48
HPGD P15428 1/20 0.48
STS P08842 1/20 0.45
KMT2A Q03164 5/20 0.44
GLA P06280 1/20 0.44
TSHR P16473 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.43
NPSR1 Q6W5P4 2/20 0.43
GAA P10253 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
NPC1 O15118 1/20 0.42
LMNA P02545 2/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41
ESRRA P11474 1/20 0.41
POLB P06746 2/20 0.40
TDP1 Q9NUW8 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9775755 0.87 ELANE (0.53) ELANEMAPTRAB9AHPGDKMT2A
SCHEMBL8998586 0.84 ELANE (0.77) ELANEMAPTRAB9AHPGDSTS
SCHEMBL175551 0.80 MAPT (0.67) ELANEMAPTRAB9AHPGDSTS
SCHEMBL4060714 0.77 ELANE (0.77) ELANEMAPTRAB9AHPGDKMT2A
SCHEMBL13508365 0.74 MAPT (0.59) ELANEMAPTRAB9AHPGDSTS
SCHEMBL5696768 0.73 NPSR1 (0.62) ELANEMAPTRAB9AHPGDKMT2A
SCHEMBL11336605 0.73 ELANE (0.75) ELANEMAPTRAB9AHPGDL3MBTL1
SCHEMBL8192783 0.72 MAPT (0.61) ELANEMAPTRAB9AHPGDSTS
SCHEMBL4061370 0.72 ELANE (0.81) ELANEMAPTRAB9AKMT2AL3MBTL1
SCHEMBL10355780 0.72 MAPT (0.67) ELANEMAPTRAB9AHPGDSTS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5024916-A Dry developable photoresist CIBA-GEIGY CORPORATION (US) 1991-06-18 US disclosed
US-4965316-A ORGANOMETALLIC CONTAINING POLYMERS CIBA-GEIGY CORPORATION (US) 1990-10-23 US disclosed
US-4916247-A INTERMEDIATES FOR POLYMERS SUITABLE FOR PHOTORESISTS; OXYGEN RESISTANT CIBA-GEIGY CORPORATION (US) 1990-04-10 US disclosed
EP-0307353-A2 Organometal-containing polymers and their use CIBA-GEIGY AG (CH) 1989-03-15 EP disclosed
EP-0307356-A2 Organometallic compounds CIBA-GEIGY AG (CH) 1989-03-15 EP disclosed