Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 12/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 3/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | KDM1A | O60341 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9775778 | 0.87 | ELANE (0.56) | ELANEKMT2ALMNAMAPTHPGD | |
| SCHEMBL653574 | 0.85 | ELANE (0.72) | ELANEKMT2AMEN1LMNAMAPT | |
| SCHEMBL9740987 | 0.81 | KMT2A (0.53) | ELANEKMT2AMEN1LMNAMAPT | |
| SCHEMBL23842601 | 0.75 | ELANE (0.56) | ELANEKMT2AMEN1MAPTHSD17B10 | |
| SCHEMBL4060714 | 0.75 | ELANE (0.77) | ELANEKMT2AMEN1LMNAMAPT | |
| SCHEMBL7061315 | 0.74 | ELANE (0.46) | ELANEKMT2AMEN1LMNAMAPT | |
| SCHEMBL1088052 | 0.74 | LMNA (0.65) | ELANEKMT2AMEN1LMNAMAPT | |
| SCHEMBL25695941 | 0.74 | ELANE (0.55) | ELANEMAPTKDM1ATDP1L3MBTL1 | |
| SCHEMBL23842564 | 0.73 | ELANE (0.49) | ELANEKMT2AMEN1MAPTHSD17B10 | |
| SCHEMBL8983109 | 0.72 | KMT2A (0.46) | ELANEKMT2AMEN1LMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4916247-A | INTERMEDIATES FOR POLYMERS SUITABLE FOR PHOTORESISTS; OXYGEN RESISTANT | CIBA-GEIGY CORPORATION (US) | 1990-04-10 | — | — | US | claimed |
| EP-0307356-A2 | Organometallic compounds | CIBA-GEIGY AG (CH) | 1989-03-15 | — | — | EP | claimed |
| US-5024916-A | Dry developable photoresist | CIBA-GEIGY CORPORATION (US) | 1991-06-18 | — | — | US | disclosed |
| US-4965316-A | ORGANOMETALLIC CONTAINING POLYMERS | CIBA-GEIGY CORPORATION (US) | 1990-10-23 | — | — | US | disclosed |
| US-4916247-A | INTERMEDIATES FOR POLYMERS SUITABLE FOR PHOTORESISTS; OXYGEN RESISTANT | CIBA-GEIGY CORPORATION (US) | 1990-04-10 | — | — | US | disclosed |
| EP-0307353-A2 | Organometal-containing polymers and their use | CIBA-GEIGY AG (CH) | 1989-03-15 | — | — | EP | disclosed |
| EP-0307356-A2 | Organometallic compounds | CIBA-GEIGY AG (CH) | 1989-03-15 | — | — | EP | disclosed |