SCHEMBL9775971

SCHEMBL9775971

CC(C)c1nc([N+](=O)[O-])c[nH]1

nearest known ligand 0.33

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
KDM4E B2RXH2 2/20 0.32
GAA P10253 1/20 0.32
MEN1 O00255 1/20 0.31
USP2 O75604 1/20 0.31
POLB P06746 1/20 0.31
KMT2A Q03164 1/20 0.31
RIPK1 Q13546 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7413687 0.82
SCHEMBL27372659 0.82
SCHEMBL28016918 0.79 ALDH1A1 (0.31) ALDH1A1
SCHEMBL15282185 0.78 KDM4E (0.30) ALDH1A1KDM4E
SCHEMBL27610721 0.77
SCHEMBL27452270 0.75 KMT2A (0.32) ALDH1A1KDM4EMEN1KMT2A
SCHEMBL11377653 0.75 MAPT (0.34) ALDH1A1KDM4EGAAMEN1USP2
SCHEMBL7570150 0.73 ALDH1A1 (0.30) ALDH1A1
SCHEMBL64072 0.73 CYP3A4 (0.33) ALDH1A1KDM4EGAAMEN1POLB
SCHEMBL28920099 0.73 ALDH1A1 (0.33) ALDH1A1KDM4EGAAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116813553-A Selective deuterated N-methylation method of polyazaaromatic compound 四川大学 2023-09-29 CN claimed
CN-116178271-A Selective N-methylation method of aza aromatic ring compound 四川大学 2023-05-30 CN claimed
JP-3025450-A None JP disclosed
CN-116813553-A Selective deuterated N-methylation method of polyazaaromatic compound 四川大学 2023-09-29 CN disclosed
CN-116178271-A Selective N-methylation method of aza aromatic ring compound 四川大学 2023-05-30 CN disclosed
JP-H0325450-A NEGATIVE CHARGEABLE TONER SHIKOKU CHEM CORP 1991-02-04 JP disclosed
US-4395415-A VACUUM DEPOSITION OF FERROMAGNETIC METAL LAYERS ON POLYMERIC SUBSTRATE; MAGNETIC TAPES; HIGH SPEED BASF AKTIENGESELLSCHAFT (DE) 1983-07-26 US disclosed
EP-0040344-A2 4-Nitro-2-trichloromethyl benzene sulphenic acid derivative, process for its preparation and fungicides containing it BASF Aktiengesellschaft (DE) 1981-11-25 EP disclosed