SCHEMBL2168089

SCHEMBL2168089

CC(=O)CC(=O)OC(C)(C)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.40

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 3/20 0.38
MEN1 O00255 1/20 0.38
MAPK1 P28482 1/20 0.38
KMT2A Q03164 1/20 0.38
MGAM O43451 1/20 0.36
GAA P10253 1/20 0.36
SI P14410 1/20 0.36
MGAM2 Q2M2H8 1/20 0.36
CA12 O43570 1/20 0.36
CA2 P00918 1/20 0.36
CA7 P43166 1/20 0.36
CA9 Q16790 1/20 0.36
CA14 Q9ULX7 1/20 0.36
ALDH1A1 P00352 2/20 0.35
LMNA P02545 2/20 0.33
ALOX15 P16050 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25968927 0.84 EPHX2 (0.43) EPHX2MEN1MAPK1KMT2ACA12
SCHEMBL12058487 0.83 EPHX2 (0.37) EPHX2MEN1MAPK1KMT2ACA12
SCHEMBL97804 0.83 EPHX2 (0.37) EPHX2MEN1MAPK1KMT2ACA12
SCHEMBL13527830 0.81 EPHX2 (0.36) EPHX2MEN1MAPK1KMT2ACA12
SCHEMBL4547708 0.81 EPHX2 (0.39) EPHX2MEN1MAPK1KMT2ACA12
SCHEMBL4547707 0.81 EPHX2 (0.36) EPHX2MEN1MAPK1KMT2ACA12
SCHEMBL12332558 0.81 EPHX2 (0.34) EPHX2MEN1MAPK1KMT2ACA12
SCHEMBL441785 0.80 MEN1 (0.39) EPHX2MEN1MAPK1KMT2AGAA
SCHEMBL12197283 0.80 EPHX2 (0.41) EPHX2MEN1MAPK1KMT2ACA12
SCHEMBL13609148 0.79 EPHX2 (0.38) EPHX2MEN1MAPK1KMT2ACA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8507174-B2 Positive resist composition, pattern forming method using the composition, and compound for use in the composition FUJIFILM CORPORATION (JP) 2013-08-13 US disclosed
EP-2450746-A1 Positive resist composition and pattern forming method using the composition Fujifilm Corporation (JP) 2012-05-09 EP disclosed
US-20110183258-A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-07-28 US disclosed
EP-2177506-A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND USED IN THE COMPOSITION Fujifilm Corporation (JP) 2010-04-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110183258-A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION CROCC, ACTR2, MRE11 EPHX2 2149/4885MEN1 4100/4885MAPK1 2745/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.