SCHEMBL978080

SCHEMBL978080

CCC(C)(CN)O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2333576 0.82
SCHEMBL2221213 0.74
Methane SCHEMBL28147691 0.72
SCHEMBL22626607 0.72
SCHEMBL13822732 0.72
SCHEMBL3481694 0.72
SCHEMBL5708413 0.72
SCHEMBL978522 0.71 CA12 (0.35)
Ammonia Solution, Strong SCHEMBL27990721 0.70 CYP2D6 (0.32)
SCHEMBL8381468 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4370568-A1 TWO-COMPONENT POLYURETHANE ADHESIVE COMPOSITION FOR FILM LAMINATION Henkel AG & Co. KGaA (DE) 2024-05-22 EP claimed
EP-4370571-A1 POLYURETHANE ADHESIVE COMPOSITION FOR FILM LAMINATION Henkel AG & Co. KGaA (DE) 2024-05-22 EP claimed
WO-2023284976-A1 POLYURETHANE ADHESIVE COMPOSITION FOR FILM LAMINATION HENKEL AG & CO. KGAA (DE) 2023-01-19 WO claimed
WO-2023284973-A1 TWO-COMPONENT POLYURETHANE ADHESIVE COMPOSITION FOR FILM LAMINATION HENKEL AG & CO. KGAA (DE) 2023-01-19 WO claimed
US-20120296024-A1 ORGANOSILICON COMPOUND AND ITS PRODUCTION METHOD, COMPOUNDING AGENT FOR RUBBER, RUBBER COMPOSITION, AND TIRE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-11-22 US claimed
EP-2524923-A1 Organosilicon compound and its production method, compounding agent for rubber, rubber composition, and tire Shin-Etsu Chemical Co., Ltd. (JP) 2012-11-21 EP claimed
EP-3543246-B1 COMPOSITION CONTAINING ORGANIC SILICON COMPOUND AND PAINT AND ADHESIVE CONTAINING SAID COMPOSITION SHINETSU CHEMICAL CO (JP) 2024-05-15 EP disclosed
US-10995106-B2 Composition containing organic silicon compound and paint and adhesive containing said composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-04 US disclosed
US-10941323-B2 Composite of metal and resin ADVANCED TECHNOLOGIES, INC. (JP) 2021-03-09 US disclosed
CN-106569388-B Photosensitive resin composition for black matrix and application thereof 奇美实业股份有限公司 2020-12-04 CN disclosed
US-20200377767-A1 COMPOSITE OF METAL AND RESIN ADVANCED TECHNOLOGIES, INC. (JP) 2020-12-03 US disclosed
CN-110997314-B Composite material of metal and resin 株式会社新技术研究所 2020-10-09 CN disclosed
EP-3663084-A1 COMPOSITE OF METAL AND RESIN Advanced Technologies, Inc. (JP) 2020-06-10 EP disclosed
US-20120296024-A1 ORGANOSILICON COMPOUND AND ITS PRODUCTION METHOD, COMPOUNDING AGENT FOR RUBBER, RUBBER COMPOSITION, AND TIRE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-11-22 US disclosed
EP-2524923-A1 Organosilicon compound and its production method, compounding agent for rubber, rubber composition, and tire Shin-Etsu Chemical Co., Ltd. (JP) 2012-11-21 EP disclosed
US-8314264-B2 Photopolymerizable functional radical-containing organosilicon compound and making method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-11-20 US disclosed
US-8263766-B2 Melamine-functional organosilicon compound and making method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-09-11 US disclosed
EP-2289898-A1 Melamine-Functional organosilicon compound and making method Shin-Etsu Chemical Co., Ltd. (JP) 2011-03-02 EP disclosed
US-20110003989-A1 MELAMINE-FUNCTIONAL ORGANOSILICON COMPOUND AND MAKING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-01-06 US disclosed
US-20100210862-A1 Photopolymerizable functional radical-containing organosilicon compound and making method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-08-19 US disclosed