SCHEMBL9800610

SCHEMBL9800610

Cc1c(N)cccc1N.Nc1ccccc1Cc1ccccc1N

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 3/20 0.64
TSHR P16473 2/20 0.64
PIK3CA P42336 1/20 0.64
ALDH1A1 P00352 3/20 0.52
TDP1 Q9NUW8 1/20 0.41
SLC6A2 P23975 1/20 0.40
SLC6A4 P31645 1/20 0.40
CD44 P16070 1/20 0.39
ALOX15 P16050 2/20 0.39
CASP7 P55210 2/20 0.39
CASP1 P29466 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
AR P10275 1/20 0.39
ESR1 P03372 1/20 0.37
KCNH2 Q12809 1/20 0.37
CYP1A2 P05177 1/20 0.37
HIF1A Q16665 1/20 0.37
HSD17B10 Q99714 1/20 0.37
FDPS P14324 1/20 0.36
HSPA5 P11021 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2780244 0.93 CYP3A4 (0.54) CYP3A4TSHRPIK3CAALDH1A1TDP1
SCHEMBL840872 0.86 CYP3A4 (0.62) CYP3A4TSHRPIK3CAALDH1A1TDP1
SCHEMBL450599 0.85 CYP3A4 (0.46) CYP3A4TSHRPIK3CAALDH1A1TDP1
SCHEMBL36019 0.85 CYP3A4 (0.53) CYP3A4TSHRALDH1A1TDP1SLC6A2
SCHEMBL29373097 0.85 CYP3A4 (0.53) CYP3A4TSHRALDH1A1TDP1SLC6A2
SCHEMBL10422322 0.85 CYP3A4 (0.50) CYP3A4TSHRPIK3CAALDH1A1TDP1
Ammonia Solution, Strong SCHEMBL9517239 0.83 CYP3A4 (0.50) CYP3A4TSHRALDH1A1TDP1SLC6A2
Hydrochloric Acid SCHEMBL11743462 0.83 CYP3A4 (0.50) CYP3A4TSHRALDH1A1TDP1SLC6A2
SCHEMBL9719138 0.83 CYP3A4 (0.50) CYP3A4TSHRALDH1A1TDP1SLC6A2
SCHEMBL1759362 0.83 CYP3A4 (0.50) CYP3A4TSHRALDH1A1TDP1SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5025078-A Curing agent; heat resistance, elongation and toughness AIR PRODUCTS AND CHEMICALS, INC. (US) 1991-06-18 US disclosed