SCHEMBL9803979

SCHEMBL9803979

CCN(CC)c1ccc(C=CC(=O)c2ccccc2)c(C)c1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.49
KMT2A Q03164 3/20 0.49
MAPK1 P28482 2/20 0.49
ALDH1A1 P00352 2/20 0.49
MEN1 O00255 2/20 0.49
USP2 O75604 1/20 0.49
POLB P06746 1/20 0.49
RECQL P46063 1/20 0.49
TLR9 Q9NR96 1/20 0.49
TDP1 Q9NUW8 1/20 0.49
L3MBTL1 Q9Y468 1/20 0.49
NPSR1 Q6W5P4 1/20 0.48
CYP1B1 Q16678 2/20 0.48
CYP1A1 P04798 1/20 0.48
TYR P14679 1/20 0.48
NPC1 O15118 4/20 0.47
RAB9A P51151 4/20 0.47
SMN1; SMN2 Q16637 4/20 0.47
HPGD P15428 1/20 0.47
LMNA P02545 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30298463 1.00 MAPT (0.49) MAPTKMT2AMAPK1ALDH1A1MEN1
SCHEMBL10478008 1.00 MAPT (0.49) MAPTKMT2AMAPK1ALDH1A1MEN1
SCHEMBL29264664 0.88 MAPT (0.51) MAPTKMT2AMAPK1ALDH1A1MEN1
SCHEMBL29264655 0.88 CHRNA7 (0.52) MAPTKMT2AMAPK1ALDH1A1MEN1
SCHEMBL29264653 0.85 TNFRSF1A (0.56) MAPTKMT2AMEN1CYP1B1CYP1A1
SCHEMBL1931677 0.85 MAPT (0.58) MAPTKMT2AMAPK1ALDH1A1MEN1
SCHEMBL29264641 0.85 MAPT (0.60) MAPTKMT2AALDH1A1MEN1CYP1B1
SCHEMBL10478012 0.84 MAPT (0.58) MAPTKMT2AMAPK1ALDH1A1MEN1
SCHEMBL12767681 0.82 S100B (0.46) MAPTKMT2AALDH1A1MEN1TDP1
SCHEMBL8877326 0.79 MAPT (0.54) MAPTALDH1A1RECQLCYP1B1CYP1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240377736-A1 PHOTOSENSITIVE COMPOSITION ARKEMA FRANCE (FR) 2024-11-14 US disclosed
CN-118019645-A Photosensitive composition 阿科玛法国公司 2024-05-10 CN disclosed
WO-2023041579-A1 PHOTOSENSITIVE COMPOSITION ARKEMA FRANCE (FR) 2023-03-23 WO disclosed
EP-4151410-A1 PHOTOSENSITIVE COMPOSITION ARKEMA FRANCE (FR) 2023-03-22 EP disclosed
US-4987056-A IMPROVED SENSITIVITY TO VISIBLE LIGHT TOYO BOSEKI KABUSHIKI KAISHA (JP) 1991-01-22 US disclosed
US-4859551-A Process for preparing positive and negative images using photohardenable electrostatic master E. I. DU PONT DE NEMOURS AND COMPANY (US) 1989-08-22 US disclosed
EP-0315121-A2 Process for preparing positive and negative images using photohardenable electrostatic master E.I. DU PONT DE NEMOURS AND COMPANY (US) 1989-05-10 EP disclosed
EP-0005274-B1 PHOTOPOLYMERISABLE COMPOSITIONS COMPRISING DERIVATIVES OF ARYL KETONES AND P-DIALKYLAMINOARYLALDEHYDES AS SENSITISERS FOR VISIBLE LIGHT E.I. DU PONT DE NEMOURS AND COMPANY (US) 1984-01-18 EP disclosed