Hydrochloric Acid

Hydrochloric Acid

SCHEMBL9812786

C1=CCC([Nb+3]C2=CC=CC2)=C1.[Cl-].[Cl-].[Cl-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8846994 0.94
SCHEMBL9152900 0.94
Bromide SCHEMBL9510950 0.94
Hydrochloric Acid SCHEMBL5086146 0.63
SCHEMBL2434250 0.63
Hydrochloric Acid SCHEMBL7063112 0.63
Hydrochloric Acid SCHEMBL781796 0.63
SCHEMBL8079535 0.63
Hydrochloric Acid SCHEMBL5827691 0.63
Hydrochloric Acid SCHEMBL17529926 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10818705-B2 Method for manufacturing a field effect transistor, method for manufacturing a volatile semiconductor memory element, method for manufacturing a non-volatile semiconductor memory element, method for manufacturing a display element, method for manufacturing an image display device, and method for manufacturing a system RICOH COMPANY, LTD. (JP) 2020-10-27 US disclosed
EP-3544047-A2 COATING LIQUID FOR FORMING OXIDE, METHOD FOR PRODUCING OXIDE FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR Ricoh Company, Ltd. (JP) 2019-09-25 EP disclosed
US-10403234-B2 Field-effect transistor, display element, image display device, and system RICOH COMPANY, LTD. (JP) 2019-09-03 US disclosed
US-20180277060-A1 FIELD-EFFECT TRANSISTOR, DISPLAY ELEMENT, IMAGE DISPLAY DEVICE, AND SYSTEM RICOH COMPANY, LTD. (JP) 2018-09-27 US disclosed
US-10008181-B2 Field-effect transistor, display element, image display device, and system RICOH COMPANY, LTD. (JP) 2018-06-26 US disclosed
US-20170271381-A1 METHOD FOR MANUFACTURING A FIELD EFFECT TRANSISTOR, METHOD FOR MANUFACTURING A VOLATILE SEMICONDUCTOR MEMORY ELEMENT, METHOD FOR MANUFACTURING A NON-VOLATILE SEMICONDUCTOR MEMORY ELEMENT, METHOD FOR MANUFACTURING A DISPLAY ELEMENT, METHOD FOR MANUFACTURING AN IMAGE DISPLAY DEVICE, AND METHOD FOR MANUFACTURING A SYSTEM RICOH COMPANY, LTD. (JP) 2017-09-21 US disclosed
US-20170263210-A1 FIELD-EFFECT TRANSISTOR, DISPLAY ELEMENT, IMAGE DISPLAY DEVICE, AND SYSTEM RICOH COMPANY, LTD. (JP) 2017-09-14 US disclosed
EP-0211630-B1 LIQUID ORGANIC POLYISOCYANATE COMPOSITIONS CONTAINING UREA AND/OR BIURET STRUCTURES ICI AMERICAS INC. (US) 1991-07-24 EP disclosed
US-4816600-A Isocyanate compositions obtained from reaction of isocyanates with blocked polamines ICI AMERICAS INC. (US) 1989-03-28 US disclosed
EP-0211630-A2 Liquid organic polyisocyanate compositions containing urea and/or biuret structures ICI AMERICAS INC. (US) 1987-02-25 EP disclosed