SCHEMBL9813477

SCHEMBL9813477

O=C(O)c1cc(-c2ccc(-c3ccccc3)cc2)c(C(=O)O)c(C(=O)O)c1C(=O)O

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 3/20 0.51
ACMSD Q8TDX5 3/20 0.50
HNF4A P41235 3/20 0.50
DHFR P00374 1/20 0.50
MCL1 Q07820 1/20 0.50
CDC25B P30305 1/20 0.50
ATM Q13315 1/20 0.50
AKR1C2 P52895 4/20 0.45
AKR1C1 Q04828 4/20 0.45
AKR1C3 P42330 2/20 0.45
DCLRE1A Q6PJP8 1/20 0.45
DCLRE1B Q9H816 1/20 0.45
PRKAB2 O43741 1/20 0.44
PRKAG1 P54619 1/20 0.44
PRKAA2 P54646 1/20 0.44
PRKAA1 Q13131 1/20 0.44
PRKAG3 Q9UGI9 1/20 0.44
PRKAG2 Q9UGJ0 1/20 0.44
PRKAB1 Q9Y478 1/20 0.44
FOLH1 Q04609 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Biphenyl SCHEMBL195288 0.96 PTPN1 (0.51) PTPN1ACMSDHNF4ADHFRMCL1
Benzene SCHEMBL3625753 0.96 PTPN1 (0.50) PTPN1ACMSDHNF4ADHFRMCL1
SCHEMBL29478249 0.96 PTPN1 (0.50) PTPN1ACMSDHNF4ADHFRMCL1
SCHEMBL49835 0.96 PTPN1 (0.50) PTPN1ACMSDHNF4ADHFRMCL1
Water SCHEMBL7131147 0.94 PTPN1 (0.49) PTPN1ACMSDHNF4ADHFRMCL1
SCHEMBL29404854 0.94 PTPN1 (0.49) PTPN1ACMSDHNF4ADHFRMCL1
SCHEMBL8804751 0.94 PTPN1 (0.49) PTPN1ACMSDHNF4ADHFRMCL1
Hydrochloric Acid SCHEMBL15549923 0.94 PTPN1 (0.49) PTPN1ACMSDHNF4ADHFRMCL1
Hydrochloric Acid SCHEMBL28954205 0.94 PTPN1 (0.49) PTPN1ACMSDHNF4ADHFRMCL1
SCHEMBL28702995 0.94 PTPN1 (0.49) PTPN1ACMSDHNF4ADHFRMCL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11407868-B2 Method for producing aqueous polyimide precursor solution composition UBE INDUSTRIES, LTD. (JP) 2022-08-09 US claimed
JP-62265327-A None JP disclosed
CN-118265745-A Polyimide film, high-frequency circuit board, and flexible electronic device board UBE株式会社 2024-06-28 CN disclosed
US-20240010802-A1 POROUS POLYIMIDE FILM AND POLYIMIDE PRECURSOR SOLUTION FUJIFILM BUSINESS INNOVATION CORP. (JP) 2024-01-11 US disclosed
CN-117339404-A Porous polyimide film, polyimide precursor solution 富士胶片商业创新有限公司 2024-01-05 CN disclosed
EP-2803702-B1 AQUEOUS POLYIMIDE PRECURSOR SOLUTION COMPOSITION AND METHOD FOR PRODUCING AQUEOUS POLYIMIDE PRECURSOR SOLUTION COMPOSITION UBE CORP (JP) 2023-11-22 EP disclosed
EP-3514869-B1 BINDER RESIN FOR ELECTRODES, ELECTRODE MIXTURE PASTE, ELECTRODE AND METHOD FOR PRODUCING ELECTRODE UBE CORP (JP) 2023-10-04 EP disclosed
US-20230192955-A1 POLYIMIDE PRECURSOR SOLUTION, POROUS POLYIMIDE FILM, AND INSULATED WIRE FUJIFILM BUSINESS INNOVATION CORP. (JP) 2023-06-22 US disclosed
US-11673999-B2 Polyimide precursor solution and method for producing porous polyimide film FUJIFILM BUSINESS INNOVATION CORP. (JP) 2023-06-13 US disclosed
CN-115997300-A Electrode for all-solid-state secondary battery, and method for manufacturing all-solid-state secondary battery UBE株式会社 2023-04-21 CN disclosed
CN-1954015-A Polyimide resin, multilayer film, multilayer film with metal layer, and semiconductor device TORAY INDUSTRIES (JP) 2007-04-25 CN disclosed
CN-1898298-A Aromatic polyamic acid and polyimide NIPPON STEEL CHEMICAL CO (JP) 2007-01-17 CN disclosed
CN-1206259-C Polyimide resin for bonding and adhesive laminate NIPPON STEEL CHEMICAL CO (JP) 2005-06-15 CN disclosed
CN-1406262-A Polyimide resin for bonding and adhesive laminate NIPPON STEEL CHEMICAL CO (JP) 2003-03-26 CN disclosed
CN-1106843-A Solutions of polyimide-forming substances and their use as coating compositions BASF LACKE & FARBEN (DE) 1995-08-16 CN disclosed
EP-0456512-A2 Polyimidesiloxane oligomer SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-11-13 EP disclosed
EP-0247731-B1 NOVEL PARA- OR META-TERPHENYLTETRACARBOXYLIC ACID, DIANHYDRIDE THEREOF AND PROCESS FOR PREPARING THE SAME Hitachi Chemical Co., Ltd. (JP) 1991-08-21 EP disclosed
US-4912233-A Para- or meta-terphenyltetracarboxylic acid, dianhydride thereof and process for preparing the same HITACHI CHEMICAL COMPANY, LTD. (JP) 1990-03-27 US disclosed
EP-0247731-A1 Novel para- or meta-terphenyltetracarboxylic acid, dianhydride thereof and process for preparing the same Hitachi Chemical Co., Ltd. (JP) 1987-12-02 EP disclosed
JP-S62265327-A NOVEL POLYAMIC ACID OR POLYAMIC ESTER AND NOVEL POLYIMIDE HITACHI CHEM CO LTD 1987-11-18 JP disclosed