SCHEMBL9815356

SCHEMBL9815356

CCCCCCCCCCCCCCCCCCCCCCCCCCCCCCOP(=O)(O)O

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
LPAR3 Q9UBY5 14/20 1.00
LPAR2 Q9HBW0 10/20 1.00
LPAR1 Q92633 7/20 1.00
LPAR5 Q9H1C0 1/20 0.59
CYP3A4 P08684 1/20 0.52
SMPD1 P17405 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7942221 1.00 LPAR3 (1.00) LPAR3LPAR2LPAR1LPAR5CYP3A4
SCHEMBL8033780 1.00 LPAR3 (1.00) LPAR3LPAR2LPAR1LPAR5CYP3A4
SCHEMBL29136 1.00 LPAR3 (1.00) LPAR3LPAR2LPAR1LPAR5CYP3A4
Hexadecyl Dihydrogen Phosphate SCHEMBL63748 1.00 LPAR3 (1.00) LPAR3LPAR2LPAR1LPAR5CYP3A4
SCHEMBL118839 1.00 LPAR3 (1.00) LPAR3LPAR2LPAR1LPAR5CYP3A4
Phosphoric Acid Monododecyl Ester SCHEMBL9437045 1.00 LPAR3 (1.00) LPAR3LPAR2LPAR1LPAR5CYP3A4
SCHEMBL1923668 1.00 LPAR3 (1.00) LPAR3LPAR2LPAR1LPAR5CYP3A4
Phosphoric Acid Monododecyl Ester SCHEMBL9316956 1.00 LPAR3 (1.00) LPAR3LPAR2LPAR1LPAR5CYP3A4
Phosphoric Acid Monododecyl Ester SCHEMBL11052336 1.00 LPAR3 (1.00) LPAR3LPAR2LPAR1LPAR5CYP3A4
SCHEMBL22325599 1.00 LPAR3 (1.00) LPAR3LPAR2LPAR1LPAR5CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114736612-B Polishing composition and method of use thereof 富士胶片电子材料美国有限公司 2023-09-26 CN claimed
CN-114920871-B Optical-grade polymethyl methacrylate resin and application thereof 万华化学集团股份有限公司 2023-09-19 CN claimed
CN-114920871-A Optical-grade polymethyl methacrylate resin and application thereof 万华化学集团股份有限公司 2022-08-19 CN claimed
CN-114736612-A Polishing composition and method of use thereof 富士胶片电子材料美国有限公司 2022-07-12 CN claimed
CN-111334193-B Polishing composition and method of use thereof 富士胶片电子材料美国有限公司 2022-05-24 CN claimed
CN-114437634-A Polishing composition and method of use thereof 富士胶片电子材料美国有限公司 2022-05-06 CN claimed
JP-3130206-A None JP disclosed
CN-114269984-B Treating agent for elastic fiber and use thereof 松本油脂制药株式会社 2024-04-26 CN disclosed
CN-117241785-A Local delivery of lipoprotein mimetic nanoparticles 美国西北大学 2023-12-15 CN disclosed
CN-114736612-B Polishing composition and method of use thereof 富士胶片电子材料美国有限公司 2023-09-26 CN disclosed
CN-114920871-B Optical-grade polymethyl methacrylate resin and application thereof 万华化学集团股份有限公司 2023-09-19 CN disclosed
CN-116348992-A Polishing composition and method of using the same 富士胶片电子材料美国有限公司 2023-06-27 CN disclosed
CN-113336443-B Digital transparent glaze applied to production of deep black full-polished ceramic tiles 广东家美陶瓷有限公司 2022-12-27 CN disclosed
CN-114920871-A Optical-grade polymethyl methacrylate resin and application thereof 万华化学集团股份有限公司 2022-08-19 CN disclosed
CN-114867827-A Lubricating oil composition for automobile gears 壳牌润滑油日本株式会社 2022-08-05 CN disclosed
CN-114736612-A Polishing composition and method of use thereof 富士胶片电子材料美国有限公司 2022-07-12 CN disclosed
CN-111334193-B Polishing composition and method of use thereof 富士胶片电子材料美国有限公司 2022-05-24 CN disclosed
CN-114437634-A Polishing composition and method of use thereof 富士胶片电子材料美国有限公司 2022-05-06 CN disclosed
CN-114269984-A Treating agent for elastic fiber and use thereof 松本油脂制药株式会社 2022-04-01 CN disclosed
JP-H03130206-A PLANT GROWTH REGULATOR AND METHOD FOR REGULATING PLANT GROWTH MITSUBISHI GAS CHEM CO INC 1991-06-04 JP disclosed