SCHEMBL9815975

SCHEMBL9815975

CCCCCCCCOC(=O)c1cccc(C(=O)CCC)c1C(=O)OCCCCCCCC

nearest known ligand 0.66

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.66
TSHR P16473 5/20 0.66
LMNA P02545 3/20 0.66
MAPK1 P28482 3/20 0.63
CYP3A4 P08684 2/20 0.63
TP53 P04637 1/20 0.63
KDM4E B2RXH2 4/20 0.58
HSD17B10 Q99714 2/20 0.58
POLB P06746 1/20 0.58
L3MBTL1 Q9Y468 3/20 0.56
TDP1 Q9NUW8 2/20 0.56
KDM4A O75164 1/20 0.48
KDM4C Q9H3R0 1/20 0.48
MMP2 P08253 1/20 0.48
MAPT P10636 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
MMP1 P03956 1/20 0.47
MMP9 P14780 1/20 0.47
MMP12 P39900 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22289795 0.91 ALDH1A1 (0.78) ALDH1A1TSHRLMNAMAPK1CYP3A4
SCHEMBL22289812 0.91 ALDH1A1 (0.78) ALDH1A1TSHRLMNAMAPK1CYP3A4
SCHEMBL22289835 0.91 ALDH1A1 (0.78) ALDH1A1TSHRLMNAMAPK1CYP3A4
SCHEMBL22289819 0.91 ALDH1A1 (0.78) ALDH1A1TSHRLMNAMAPK1CYP3A4
SCHEMBL22289768 0.91 ALDH1A1 (0.78) ALDH1A1TSHRLMNAMAPK1CYP3A4
SCHEMBL9359141 0.91 ALDH1A1 (0.78) ALDH1A1TSHRLMNAMAPK1CYP3A4
SCHEMBL22289759 0.90 TSHR (0.77) ALDH1A1TSHRLMNAMAPK1CYP3A4
SCHEMBL28467179 0.88 ALDH1A1 (0.64) ALDH1A1TSHRLMNAMAPK1CYP3A4
SCHEMBL3702285 0.86 ALDH1A1 (0.62) ALDH1A1TSHRLMNAMAPK1CYP3A4
SCHEMBL27556341 0.86 ALDH1A1 (0.69) ALDH1A1TSHRLMNAMAPK1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0133917-B1 PROCESS FOR FORMING A PATTERN OF ELECTRICALLY CONDUCTIVE LINES ON THE TOP OF A CERAMIC SUBSTRATE International Business Machines Corporation (US) 1991-10-02 EP disclosed
EP-0133917-A2 Process for forming a pattern of electrically conductive lines on the top of a ceramic substrate International Business Machines Corporation (US) 1985-03-13 EP disclosed