⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15867187 | 0.77 | TSHR (0.32) | — | |
| SCHEMBL8966897 | 0.75 | TSHR (0.30) | — | |
| SCHEMBL8436265 | 0.73 | DNM1 (0.35) | — | |
| SCHEMBL332719 | 0.65 | TSHR (0.38) | — | |
| SCHEMBL7633516 | 0.65 | TSHR (0.32) | — | |
| SCHEMBL2602762 | 0.62 | TSHR (0.30) | — | |
| SCHEMBL5027220 | 0.62 | — | — | |
| Ammonia Solution, Strong SCHEMBL19874799 | 0.62 | TSHR (0.35) | — | |
| SCHEMBL312679 | 0.62 | TSHR (0.35) | — | |
| SCHEMBL43618 | 0.62 | TSHR (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11754926-B2 | Method of forming resist pattern, resist composition and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-20230273521-A1 | CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |
| US-20230229084-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-20 | — | — | US | disclosed |
| US-20230127914-A1 | RESIST PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| EP-0188235-B1 | PRODUCTION OF OPTICALLY PURE ORGANOBORANES | Aldrich Chemical Company, Inc. (US) | 1991-12-11 | — | — | EP | disclosed |
| US-4713380-A | Production of optically pure organoboranes | ALDRICH-BORANES, INC. (US) | 1987-12-15 | — | — | US | disclosed |
| EP-0188235-A2 | Production of optically pure organoboranes | Aldrich Chemical Company, Inc. (US) | 1986-07-23 | — | — | EP | disclosed |