Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.58 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | ACLY | P53396 | 2/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1824514 | 1.00 | THRB (0.58) | THRBTSHRKDM4ETDP1L3MBTL1 | |
| SCHEMBL541097 | 1.00 | THRB (0.58) | THRBTSHRKDM4ETDP1L3MBTL1 | |
| SCHEMBL5494043 | 1.00 | THRB (0.58) | THRBTSHRKDM4ETDP1L3MBTL1 | |
| SCHEMBL5486150 | 1.00 | THRB (0.58) | THRBTSHRKDM4ETDP1L3MBTL1 | |
| SCHEMBL5485668 | 1.00 | THRB (0.58) | THRBTSHRKDM4ETDP1L3MBTL1 | |
| SCHEMBL198881 | 1.00 | THRB (0.58) | THRBTSHRKDM4ETDP1L3MBTL1 | |
| SCHEMBL198315 | 1.00 | THRB (0.58) | THRBTSHRKDM4ETDP1L3MBTL1 | |
| SCHEMBL5496340 | 1.00 | THRB (0.58) | THRBTSHRKDM4ETDP1L3MBTL1 | |
| SCHEMBL5487374 | 1.00 | THRB (0.58) | THRBTSHRKDM4ETDP1L3MBTL1 | |
| Ammonia Solution, Strong SCHEMBL3408582 | 0.98 | THRB (0.56) | THRBTSHRKDM4ETDP1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240059860-A1 | METHODS AND SYSTEMS FOR DESTRUCTION OF SYNTHETIC PER- AND POLYFLUORO COMPOUNDS | CHZ TECHNOLOGIES, LLC | 2024-02-22 | — | — | US | disclosed |
| CN-117510912-A | Organic fluorine modified graphene modified PVDF piezoelectric film and preparation method thereof | 浙江百安医疗科技有限公司 | 2024-02-06 | — | — | CN | disclosed |
| EP-3473610-B1 | METHOD OF PURIFYING A FLUORINATED C2-C20 ORGANIC ACID | DAIKIN IND LTD (JP) | 2023-07-19 | — | — | EP | disclosed |
| CN-109311796-B | Method for producing fluorinated organic acid having 2 to 20 carbon atoms, and composition containing fluorinated organic acid having 2 to 20 carbon atoms | 大金工业株式会社 | 2022-03-22 | — | — | CN | disclosed |
| EP-1686425-B1 | METHOD FOR FORMING MULTILAYER RESIST | DAIKIN IND LTD (JP) | 2018-06-13 | — | — | EP | disclosed |
| EP-1818723-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR CORP (JP) | 2011-05-04 | — | — | EP | disclosed |
| US-7875752-B2 | conducting a chemical reaction in a non-fluorous medium using a fluorous compound in the presence of a solid adsorbant containing a fluorous domain and at least one chemical reactant; e.g., hydroformylation, hydrosilation | FLUOROUS TECHNOLOGIES INCORPORATED (US) | 2011-01-25 | — | — | US | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-7645036-B2 | Ink-jet recording ink set and ink-jet recording method | FUJIFILM CORPORATION (JP) | 2010-01-12 | — | — | US | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| EP-0552063-A1 | Polyolefin resin composition and film thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-07-21 | — | — | EP | disclosed |
| US-5113477-A | Core, cladding, heat resistance | HITACHI, LTD. (JP) | 1992-05-12 | — | — | US | disclosed |
| US-5049275-A | Modified microporous structures | HOECHST CELANESE CORP. (US) | 1991-09-17 | — | — | US | disclosed |
| US-4789599-A | EPOXY CONTAINING VINYL CHLORIDE RESIN, PERFLUOROALKYL ACID, MAGNETIC POWDER; HEAT RESISTANCE | NIPPON ZEON CO., LTD. (JP) | 1988-12-06 | — | — | US | disclosed |
| EP-0226020-A2 | Plastic optical fibers and transparent resin used therefor | HITACHI, LTD. (JP) | 1987-06-24 | — | — | EP | disclosed |
| US-4268599-A | Treated toner magnetic carrier and method of making the same | PITNEY BOWES, INC. (US) | 1981-05-19 | — | — | US | disclosed |
| US-4225660-A | COATING OF POLYMER HAVING PERFLUORO COMPOUND COVALENTLY BONDED | PITNEY BOWES INC. (US) | 1980-09-30 | — | — | US | disclosed |
| US-4141874-A | Fluorine-containing elastomeric copolymers, process for preparing the same and composition containing the same | DAIKIN KOGYO CO., LTD. (JP) | 1979-02-27 | — | — | US | disclosed |
| US-4093459-A | Treated carrier particles used in electrophotographic process | ADDRESSOGRAPH-MULTIGRAPH CORPORATION (US) | 1978-06-06 | — | — | US | disclosed |
| US-3957672-A | FLUORINATED POLYETHERS | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) | 1976-05-18 | — | — | US | disclosed |