⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9462518 | 0.73 | — | — | |
| SCHEMBL486362 | 0.73 | — | — | |
| SCHEMBL3960005 | 0.73 | — | — | |
| SCHEMBL16594820 | 0.73 | — | — | |
| SCHEMBL136614 | 0.73 | — | — | |
| SCHEMBL16594819 | 0.73 | — | — | |
| Bromide SCHEMBL932220 | 0.71 | — | — | |
| SCHEMBL16641900 | 0.71 | BLM (0.40) | — | |
| SCHEMBL3811275 | 0.69 | — | — | |
| SCHEMBL1400583 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120192460-A | Modified polyethylene for preparing high-safety lithium battery separator, and preparation method and application thereof | 朴烯晶新能源材料(上海)有限公司 | 2025-06-24 | — | — | CN | disclosed |
| EP-2507669-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2015-01-07 | — | — | EP | disclosed |
| US-8741542-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-06-03 | — | — | US | disclosed |
| EP-2507669-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM Corporation (JP) | 2012-10-10 | — | — | EP | disclosed |
| US-20120244472-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-09-27 | — | — | US | disclosed |
| WO-2011065594-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-06-03 | — | — | WO | disclosed |
| US-20110014504-A1 | LITHIUM SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2011-01-20 | — | — | US | disclosed |
| CN-100563056-C | Lithium secondary battery | MITSUBISHI CHEM CORP (JP) | 2009-11-25 | — | — | CN | disclosed |
| US-20080311478-A1 | Lithium Secondary Battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2008-12-18 | — | — | US | disclosed |
| CN-101203982-A | Lithium secondary battery | MITSUBISHI CHEM CORP (JP) | 2008-06-18 | — | — | CN | disclosed |
| EP-1892789-A1 | LITHIUM SECONDARY BATTERY | Mitsubishi Chemical Corporation (JP) | 2008-02-27 | — | — | EP | disclosed |