SCHEMBL9819079

SCHEMBL9819079

CCCCCc1ccc(N)cc1N

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TYR P14679 3/20 0.46
MEN1 O00255 2/20 0.46
TP53 P04637 2/20 0.46
MAPT P10636 2/20 0.46
HTT P42858 2/20 0.46
KMT2A Q03164 2/20 0.46
TSHR P16473 2/20 0.46
CYP3A4 P08684 1/20 0.46
ALOX5 P09917 1/20 0.46
ALOX15 P16050 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
TLR8 Q9NR97 5/20 0.44
HTR2A P28223 1/20 0.42
SRC P12931 1/20 0.42
CASP1 P29466 2/20 0.42
KDM4E B2RXH2 1/20 0.42
USP2 O75604 1/20 0.42
ALDH1A1 P00352 1/20 0.42
POLB P06746 1/20 0.42
GAA P10253 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9025493 0.98 MAPT (0.49) TYRMEN1TP53MAPTHTT
SCHEMBL10496381 0.98 MAPT (0.49) TYRMEN1TP53MAPTHTT
SCHEMBL28173458 0.98 MAPT (0.49) TYRMEN1TP53MAPTHTT
SCHEMBL10635917 0.98 MAPT (0.49) TYRMEN1TP53MAPTHTT
SCHEMBL28243322 0.98 MAPT (0.49) TYRMEN1TP53MAPTHTT
SCHEMBL7568808 0.98 MAPT (0.49) TYRMEN1TP53MAPTHTT
SCHEMBL10492538 0.94 TYR (0.46) TYRMEN1TP53MAPTHTT
Hydrochloric Acid SCHEMBL11214753 0.92 MAPT (0.46) TYRMEN1TP53MAPTHTT
SCHEMBL10894932 0.89 CASP1 (0.42) MEN1TP53MAPTHTTKMT2A
Hydrochloric Acid SCHEMBL10893099 0.87 CASP1 (0.41) MEN1TP53MAPTHTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108789186-A Manufacturing has the method for the chemical mechanical polishing layer for improving uniformity 陶氏环球技术有限责任公司 2018-11-13 CN disclosed
CN-108202436-A For manufacturing the chemical-mechanical planarization with overall window(CMP)The method of polishing pad 罗门哈斯电子材料CMP控股股份有限公司 2018-06-26 CN disclosed
CN-108115554-A Improvement composition and CMP pad prepared therefrom for chemical mechanical polishing pads 罗门哈斯电子材料CMP控股股份有限公司 2018-06-05 CN disclosed
CN-108115555-A For manufacturing chemical-mechanical planarization(CMP)Polishing pad without aerosolization method 陶氏环球技术有限责任公司 2018-06-05 CN disclosed
CN-108115592-A It is used to prepare chemical-mechanical planarization(CMP)The aerosol method of polishing pad 陶氏环球技术有限责任公司 2018-06-05 CN disclosed
EP-0255930-B1 POLYURETHANE FOAMS INCORPORATING ALKOXYLATED AROMATIC DIAMINE AND ACETYLENIC GLYCOL AIR PRODUCTS AND CHEMICALS, INC. (US) 1991-12-11 EP disclosed
US-4743628-A CROSSLINKING, HIGHER LOAD-BEARING, TEAR STRENGTH, ELONGATION AIR PRODUCTS AND CHEMICALS, INC. (US) 1988-05-10 US disclosed
EP-0255930-A2 Polyurethane foams incorporating alkoxylated aromatic diamine and acetylenic glycol AIR PRODUCTS AND CHEMICALS, INC. (US) 1988-02-17 EP disclosed