⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12654038 | 1.00 | — | — | |
| SCHEMBL981062 | 0.84 | — | — | |
| SCHEMBL4950949 | 0.82 | — | — | |
| SCHEMBL30266479 | 0.80 | CA1 (0.36) | — | |
| SCHEMBL24996050 | 0.72 | — | — | |
| SCHEMBL874698 | 0.69 | — | — | |
| SCHEMBL7077764 | 0.69 | — | — | |
| SCHEMBL1457003 | 0.69 | — | — | |
| SCHEMBL8935410 | 0.69 | — | — | |
| SCHEMBL1309330 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250296918-A1 | METHOD FOR PRODUCING MERCAPTO HETEROCYCLIC COMPOUND AND METHOD FOR TESTING THE SAME | RESONAC CORPORATION (JP) | 2025-09-25 | — | — | US | disclosed |
| CN-117720689-A | Flocculant for concrete mixture water-washed sand and preparation method thereof | 江苏奥莱特新材料股份有限公司 | 2024-03-19 | — | — | CN | disclosed |
| CN-117412997-A | Water-absorbent resin composition, and absorbent article using same | 三大雅株式会社 | 2024-01-16 | — | — | CN | disclosed |
| WO-2023210608-A1 | PRODUCTION METHOD AND TEST METHOD FOR MERCAPTO HETEROCYCLIC COMPOUND | 株式会社レゾナック | 2023-11-02 | — | — | WO | disclosed |
| WO-2023188719-A1 | WATER-ABSORBING RESIN COMPOSITION, ABSORBER AND ABSORBENT ARTICLE OBTAINED USING SAME, AND METHOD FOR PRODUCING WATER-ABSORBING RESIN COMPOSITION | ＳＤＰグローバル株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-20230314939-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| WO-2023188712-A1 | METHOD FOR PRODUCING WATER-ABSORBING RESIN COMPOSITION, WATER-ABSORBING RESIN COMPOSITION, ABSORBING BODY USING SAME, AND ABSORBENT ARTICLE | ＳＤＰグローバル株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023188633-A1 | WATER-ABSORBABLE RESIN COMPOSITION, ABSORBER AND ABSORBENT ARTICLE EACH USING SAME, AND METHOD FOR PRODUCING WATER-ABSORBABLE RESIN COMPOSITION | ＳＤＰグローバル株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-20230161244-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161243-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| EP-2024330-A1 | PRODUCTION METHOD OF HETEROCYCLIC MERCAPTO COMPOUND | Showa Denko K.K. (JP) | 2009-02-18 | — | — | EP | disclosed |
| US-20080311478-A1 | Lithium Secondary Battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2008-12-18 | — | — | US | disclosed |
| EP-1972641-A2 | Resist composition and pattern-forming method using same | FUJIFILM Corporation (JP) | 2008-09-24 | — | — | EP | disclosed |
| EP-1892789-A1 | LITHIUM SECONDARY BATTERY | Mitsubishi Chemical Corporation (JP) | 2008-02-27 | — | — | EP | disclosed |
| WO-2007139215-A1 | PRODUCTION METHOD OF HETEROCYCLIC MERCAPTO COMPOUND | SHOWA DENKO K.K. (JP) | 2007-12-06 | — | — | WO | disclosed |
| EP-1838316-A2 | MACROCYCLIC ANALOGS FOR THE TREATMENT OF IMMUNOREGULATORY DISORDERS AND RESPIRATORY DISEASES | Array Biopharma, Inc. (US) | 2007-10-03 | — | — | EP | disclosed |
| US-7232642-B2 | Chemically amplified positive resist composition, a haloester derivative and a process for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-06-19 | — | — | US | disclosed |
| US-7232642-B2 | Chemically amplified positive resist composition, a haloester derivative and a process for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-06-19 | — | — | US | disclosed |
| WO-2006078724-A2 | MACROCYCLIC ANALOGS FOR THE TREATMENT OF IMMUNOREGULATORY DISORDERS AND RESPIRATORY DISEASES | ARRAY BIOPHARMA NC. (US) | 2006-07-27 | — | — | WO | disclosed |
| US-20060160838-A1 | Macrocyclic analogs for the treatment of immunoregulatory disorders and respiratory diseases | ARRAY BIOPHARMA INC. | 2006-07-20 | — | — | US | disclosed |