Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 6/20 | 0.66 |
| ▸ | MEN1 | O00255 | 6/20 | 0.61 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.61 |
| ▸ | LMNA | P02545 | 2/20 | 0.61 |
| ▸ | POLB | P06746 | 1/20 | 0.58 |
| ▸ | ATM | Q13315 | 1/20 | 0.58 |
| ▸ | S100A4 | P26447 | 1/20 | 0.47 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | CTSV | O60911 | 1/20 | 0.42 |
| ▸ | CTSL | P07711 | 1/20 | 0.42 |
| ▸ | PARP1 | P09874 | 1/20 | 0.42 |
| ▸ | F2RL3 | Q96RI0 | 1/20 | 0.41 |
| ▸ | MPI | P34949 | 1/20 | 0.41 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.41 |
| ▸ | F2 | P00734 | 1/20 | 0.41 |
| ▸ | PLAU | P00749 | 1/20 | 0.41 |
| ▸ | KLKB1 | P03952 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11651352 | 0.92 | MAPT (0.53) | MAPTMEN1KMT2ALMNAPOLB | |
| SCHEMBL11882055 | 0.84 | MAPT (0.46) | MAPTMEN1KMT2ALMNAPOLB | |
| SCHEMBL6139257 | 0.81 | MAPT (0.68) | MAPTMEN1KMT2ALMNAPOLB | |
| SCHEMBL11333257 | 0.81 | MAPT (0.47) | MAPTMEN1KMT2ALMNAPOLB | |
| SCHEMBL11735178 | 0.80 | MAPT (0.59) | MAPTMEN1KMT2ALMNAPOLB | |
| SCHEMBL150552 | 0.80 | MAPT (1.00) | MAPTMEN1KMT2ALMNAPOLB | |
| SCHEMBL5025482 | 0.78 | MAPT (0.64) | MAPTMEN1KMT2ALMNAPOLB | |
| SCHEMBL606886 | 0.78 | MAPT (0.64) | MAPTMEN1KMT2ALMNAPOLB | |
| SCHEMBL15753214 | 0.77 | MAPT (0.68) | MAPTMEN1KMT2ALMNAPOLB | |
| SCHEMBL18109210 | 0.77 | MAPT (0.68) | MAPTMEN1KMT2ALMNAPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0130088-A2 | Plasma developable negative resist compositions for electron beam, X-ray and optical lithography | TEXAS INSTRUMENTS INCORPORATED (US) | 1985-01-02 | — | — | EP | claimed |
| US-4097277-A | Photosensitive member having layer of vinyl carbazole polymer containing antimony chalcogen compound of antimony and sulfur | CANON KABUSHIKI KAISHA (JA) | 1978-06-27 | — | — | US | claimed |
| US-3989860-A | Repair technique for photoreceptors | XEROX CORPORATION (US) | 1976-11-02 | — | — | US | claimed |
| JP-3157471-A | — | — | None | — | — | JP | disclosed |
| JP-H03157471-A | ADHESIVE FOR OPTICAL USE | SOGO SHIKA IRYO KENKYUSHO:KK | 1991-07-05 | — | — | JP | disclosed |
| US-4657844-A | Plasma developable negative resist compositions for electron beam, X-ray and optical lithography | TEXAS INSTRUMENTS INCORPORATED (US) | 1987-04-14 | — | — | US | disclosed |
| EP-0130088-A2 | Plasma developable negative resist compositions for electron beam, X-ray and optical lithography | TEXAS INSTRUMENTS INCORPORATED (US) | 1985-01-02 | — | — | EP | disclosed |
| US-4341853-A | Spectral sensitization of organic photoconductors with diazastryl dyes | FUJI PHOTO FILM CO., LTD. (JP) | 1982-07-27 | — | — | US | disclosed |
| US-4334001-A | Azacyanine spectra sensitized organic photoconductive compositions and elements | FUJI PHOTO FILM CO., LTD. (JP) | 1982-06-08 | — | — | US | disclosed |
| US-4111850-A | CHARGE TRANSFER COMPLEX OF A FLUORENONE AND A CARBAZOLE | AMP INCORPORATED (US) | 1978-09-05 | — | — | US | disclosed |
| US-4097277-A | Photosensitive member having layer of vinyl carbazole polymer containing antimony chalcogen compound of antimony and sulfur | CANON KABUSHIKI KAISHA (JA) | 1978-06-27 | — | — | US | disclosed |
| US-4095032-A | PHOTOSENSITIVE POLYMERIC MATERIAL AND ELECTROPHOTOMETRIC MATERIAL PREPARED BY REACTING SECONDARY AROMATIC AMINE WITH VINYL ALKYLETHER OR VINYL ACETATE IN THE PRESENCE OF STRONG ACID AND HG (II) OR PB (IV) CATALYST | SIROTKINA EKATERINA EGOROVNA | 1978-06-13 | — | — | US | disclosed |
| US-4042388-A | FREE RADICAL FORMERS, DYES | CANON KABUSHIKI KAISHA (JA) | 1977-08-16 | — | — | US | disclosed |
| US-4038468-A | POLY-N-VINYL HETEROCYCLIC AMINES FROM VINYL ETHERS AND SECONDARY AMINES | SIROTKINA EKATERINA EGOROVNA | 1977-07-26 | — | — | US | disclosed |
| US-4007317-A | A POLYVINYL CARBAZOLE | SIROTKINA EKATERINA EGOROVNA | 1977-02-08 | — | — | US | disclosed |
| US-4001014-A | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE PLATE HAVING TELLURIUM PRESENT IN VARYING CONCENTRATIONS ACROSS ITS THICKNESS | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JA) | 1977-01-04 | — | — | US | disclosed |
| US-3989860-A | Repair technique for photoreceptors | XEROX CORPORATION (US) | 1976-11-02 | — | — | US | disclosed |
| US-3986873-A | ELECTROGRAPHY | SIROTKINA EKATERINA EGOROVNA | 1976-10-19 | — | — | US | disclosed |