⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8373207 | 0.98 | — | — | |
| SCHEMBL2210924 | 0.98 | — | — | |
| SCHEMBL2212022 | 0.86 | — | — | |
| SCHEMBL2212534 | 0.84 | — | — | |
| SCHEMBL3389175 | 0.84 | — | — | |
| SCHEMBL431619 | 0.84 | — | — | |
| SCHEMBL449924 | 0.84 | — | — | |
| SCHEMBL2691269 | 0.82 | — | — | |
| SCHEMBL659526 | 0.82 | — | — | |
| SCHEMBL264761 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114261039-A | Template passivation process | 广东粤港澳大湾区国家纳米科技创新研究院 | 2022-04-01 | — | — | CN | claimed |
| CN-109777291-B | Self-cleaning glass hydrophobing agent | 湖北新四海化工股份有限公司 | 2021-08-10 | — | — | CN | claimed |
| US-20150099289-A1 | CARBONIC ANHYDRASE XEROGEL PARTICLES | CO2 SOLUTIONS INC. (CA) | 2015-04-09 | — | — | US | claimed |
| US-20140147631-A1 | MANUFACTURE OF HYDROPHOBIC SURFACES | THE TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIA (US) | 2014-05-29 | — | — | US | claimed |
| WO-2012138992-A2 | DESIGN AND MANUFACTURE OF HYDROPHOBIC SURFACES | THE TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIA (US) | 2012-10-11 | — | — | WO | claimed |
| US-20250249148-A1 | FORMULATIONS AND PROCESSES TO GENERATE REPELLENT SURFACES ON MEDICAL DEVICES | SPOTLESS MATERIALS INC. | 2025-08-07 | — | — | US | disclosed |
| EP-4590774-A1 | REPELLENT COATING FORMULATION WITH LOW VOLATILE ORGANIC COMPOUNDS | Spotless Materials Inc. (US) | 2025-07-30 | — | — | EP | disclosed |
| US-20250230325-A1 | REPELLENT COATING FORMULATION WITH LOW VOLATILE ORGANIC COMPOUNDS | SPOTLESS MATERIALS INC. | 2025-07-17 | — | — | US | disclosed |
| US-12280175-B2 | Formulations and processes to generate repellent surfaces on medical devices | SPOTLESS MATERIALS INC. (US) | 2025-04-22 | — | — | US | disclosed |
| US-12084581-B2 | Self-healing, omniphobic coatings and related methods | UNIVERSITY OF KANSAS (US) | 2024-09-10 | — | — | US | disclosed |
| US-20240181131-A1 | FORMULATIONS AND PROCESSES TO GENERATE REPELLENT SURFACES ON MEDICAL DEVICES | SPOTLESS MATERIALS INC. | 2024-06-06 | — | — | US | disclosed |
| EP-4361228-A1 | FORMULATIONS AND PROCESSES TO GENERATE REPELLENT SURFACES | Spotless Materials Inc. (US) | 2024-05-01 | — | — | EP | disclosed |
| US-20110014389-A1 | LYOPHILIC/LYOPHOBIC PATTERN-FORMING METHOD AND ORGANIC ELECTROLUMINESCENT ELEMENT MANUFACTURING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-7862989-B2 | fabrication of dual damascene structures using imprint lithographic techniques; fabrication of dual damascene relief structures in imprint lithography molds | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-01-04 | — | — | US | disclosed |
| US-7837459-B2 | Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-11-23 | — | — | US | disclosed |
| US-20090023083-A1 | fabrication of dual damascene structures using imprint lithographic techniques; fabrication of dual damascene relief structures in imprint lithography molds | GLOBALFOUNDRIES U.S. INC. | 2009-01-22 | — | — | US | disclosed |
| US-20080303160-A1 | Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning | GLOBALFOUNDRIES U.S. INC. | 2008-12-11 | — | — | US | disclosed |
| US-20080305197-A1 | Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning | GLOBALFOUNDRIES U.S. INC. | 2008-12-11 | — | — | US | disclosed |
| US-7435074-B2 | Method for fabricating dual damascence structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascence patterning | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-10-14 | — | — | US | disclosed |
| US-20050202350-A1 | Multilevel mold; used for the interconnect architecture of semiconductor chips | GLOBALFOUNDRIES U.S. INC. | 2005-09-15 | — | — | US | disclosed |