⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL441144 | 0.97 | — | — | |
| SCHEMBL10431909 | 0.94 | — | — | |
| SCHEMBL9747616 | 0.94 | — | — | |
| SCHEMBL9842486 | 0.94 | — | — | |
| SCHEMBL108130 | 0.94 | — | — | |
| SCHEMBL10822007 | 0.94 | — | — | |
| SCHEMBL2304744 | 0.94 | — | — | |
| SCHEMBL9596038 | 0.94 | — | — | |
| SCHEMBL9347264 | 0.94 | — | — | |
| SCHEMBL9594852 | 0.94 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102327775-B | Exhaust gas purification catalyst | CATALER CORP. (JP) | 2015-12-02 | — | — | CN | disclosed |
| US-20140072819-A1 | COMPOSITION FOR FORMING FERROELECTRIC THIN FILM, METHOD FOR FORMING THIN FILM AND THIN FILM FORMED USING THE SAME METHOD | MITSUBISHI MATERIALS CORPORATION (JP) | 2014-03-13 | — | — | US | disclosed |
| EP-2706049-A1 | Composition for forming ferroelectric thin film, method for forming thin film and thin film formed using the same method | Mitsubishi Materials Corporation (JP) | 2014-03-12 | — | — | EP | disclosed |
| EP-2642510-A2 | Composition for forming ferroelectric thin film, method for forming ferroelectric thin film, ferroelectric thin film, and complex electronic component | Mitsubishi Materials Corporation (JP) | 2013-09-25 | — | — | EP | disclosed |
| US-20130136937-A1 | COMPOSITION FOR FORMING FERROELECTRIC THIN FILM, METHOD FOR FORMING FERROELECTRIC THIN FILM, FERROELECTRIC THIN FILM, AND COMPLEX ELECTRONIC COMPONENT | MITSUBISHI MATERIALS CORPORATION (JP) | 2013-05-30 | — | — | US | disclosed |
| CN-101489672-B | Catalyst for exhaust gas purification | CATALER CORP | 2012-07-04 | — | — | CN | disclosed |
| CN-102327775-A | Exhaust gas purification catalyst | CATALER CORP | 2012-01-25 | — | — | CN | disclosed |
| CN-101489672-A | Catalyst for exhaust gas purification | CATALER CORP (JP) | 2009-07-22 | — | — | CN | disclosed |
| US-5001110-A | Organometallic solutions for forming oxide superconducting films | TORAY INDUSTRIES, INC. (JP) | 1991-03-19 | — | — | US | disclosed |
| US-4920093-A | FORMING FILM OF METAL ALKOXIDE MIXTURE, SOLVENT, HYDROLYSIS INHIBITOR ON SUBSTRATE, DRYING, CALCINING | TORAY INDUSTRIES, INC. (JP) | 1990-04-24 | — | — | US | disclosed |
| EP-0292967-A2 | Method of forming superconductive thin films and solutions for forming the same | TORAY INDUSTRIES, INC. (JP) | 1988-11-30 | — | — | EP | disclosed |