Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TET2 | Q6N021 | 2/20 | 0.42 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.32 |
| ▸ | HMGCR | P04035 | 1/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.32 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.32 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL27540002 | 1.00 | TET2 (0.42) | TET2PIK3CDHMGCRCHRM1TBXA2R | |
| Bicarbonate SCHEMBL28372058 | 0.86 | HMGCR (0.39) | TET2PIK3CDHMGCRCHRM1TBXA2R | |
| SCHEMBL167278 | 0.82 | TP53 (0.36) | TET2PIK3CDHMGCRCHRM1TBXA2R | |
| SCHEMBL1275819 | 0.82 | TP53 (0.36) | TET2PIK3CDHMGCRCHRM1TBXA2R | |
| Methacrylic Acid SCHEMBL9779389 | 0.81 | TET2 (0.36) | TET2TSHR | |
| SCHEMBL259423 | 0.81 | TSHR (0.42) | TSHR | |
| Acrylic Acid SCHEMBL28471649 | 0.81 | LMNA (0.39) | TET2HMGCRCHRM1TBXA2RADRA1A | |
| Methacrylic Acid SCHEMBL9779559 | 0.79 | TSHR (0.34) | TET2TSHR | |
| Methacrylic Acid SCHEMBL27698778 | 0.79 | TET2 (0.41) | TET2PIK3CDTSHR | |
| Methacrylic Acid SCHEMBL28401998 | 0.79 | TET2 (0.41) | TET2PIK3CDTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113814070-B | Environment-friendly coal dressing flotation reagent and preparation method thereof | 唐山市德丰机械设备有限公司 | 2023-06-06 | — | — | CN | claimed |
| CN-113820920-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2023-07-04 | — | — | CN | disclosed |
| CN-113814070-B | Environment-friendly coal dressing flotation reagent and preparation method thereof | 唐山市德丰机械设备有限公司 | 2023-06-06 | — | — | CN | disclosed |
| CN-113814070-B | Environment-friendly coal dressing flotation reagent and preparation method thereof | 唐山市德丰机械设备有限公司 | 2023-06-06 | — | — | CN | disclosed |
| CN-116209577-A | Flexographic printing plate precursor, imaging assembly and use | 米瑞控公司 | 2023-06-02 | — | — | CN | disclosed |
| CN-113544120-B | Novel compound, composition containing same, self-repairing material, surface coating agent, paint, adhesive, battery material, and cured product | 株式会社ADEKA | 2023-05-02 | — | — | CN | disclosed |
| CN-113820920-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-12-21 | — | — | CN | disclosed |
| CN-113544120-A | Novel compound, composition containing same, and cured product | 株式会社ADEKA | 2021-10-22 | — | — | CN | disclosed |
| CN-107850844-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-09-07 | — | — | CN | disclosed |
| EP-0405582-A2 | Method for making optically readable media containing embossed information | Koninklijke Philips Electronics N.V. (NL) | 1991-01-02 | — | — | EP | disclosed |
| EP-0041642-A2 | Integrated laminating process | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-16 | — | — | EP | disclosed |