Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5972736 | 0.86 | MAPT (0.33) | MAPTKMT2A | |
| SCHEMBL5972835 | 0.85 | MAPT (0.32) | MAPTCA1CA2 | |
| SCHEMBL642592 | 0.83 | MAPT (0.41) | MAPTKMT2ACA1CA2CA4 | |
| SCHEMBL515933 | 0.82 | MAPT (0.43) | MAPTKMT2ACA1CA2CA4 | |
| SCHEMBL5907888 | 0.79 | MAPT (0.34) | MAPT | |
| SCHEMBL8876738 | 0.76 | MAPT (0.38) | MAPTCA1CA2CA4 | |
| SCHEMBL546970 | 0.76 | CHRM2 (0.30) | — | |
| SCHEMBL6725040 | 0.75 | MAPT (0.43) | MAPTCA1CA2 | |
| SCHEMBL7204129 | 0.74 | MAPT (0.33) | MAPT | |
| SCHEMBL547423 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2325695-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2017-12-20 | — | — | EP | disclosed |
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| EP-2503392-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2015-04-15 | — | — | EP | disclosed |
| US-8562844-B2 | Methods using block co-polymer self-assembly for sub-lithographic patterning | MICRON TECHNOLOGY, INC. (US) | 2013-10-22 | — | — | US | disclosed |
| US-20120295197-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMING A RESIST PATTERN | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| EP-1961739-B1 | NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION | JSR CORP (JP) | 2012-10-17 | — | — | EP | disclosed |
| US-8288073-B2 | Pattern forming method | JSR CORPORATION (JP) | 2012-10-16 | — | — | US | disclosed |
| US-8263315-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2012-09-11 | — | — | US | disclosed |
| US-8026039-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2011-09-27 | — | — | US | disclosed |
| US-7964107-B2 | Methods using block copolymer self-assembly for sub-lithographic patterning | MICRON TECHNOLOGY, INC. (US) | 2011-06-21 | — | — | US | disclosed |
| US-20030091929-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-15 | — | — | US | disclosed |
| US-20030087181-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-08 | — | — | US | disclosed |
| US-20030054289-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-03-20 | — | — | US | disclosed |
| US-20030031952-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-02-13 | — | — | US | disclosed |
| US-6461788-B1 | COMPOUNDS HAVING SPECIFIC CYCLOHEXANELACTONE STRUCTURE FORM POLYMERS HAVING HIGH TRANSPARENCY AT SHORT WAVELENGTH SUCH AS ARGON FLUORIDE EXCIMER LASER, EXCELLENT DRY ETCHING RESISTANCE AND SUBSTRATE ADHERENCE; USEFUL FOR RESISTS | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2002-10-08 | — | — | US | disclosed |
| US-6462158-B1 | USEFUL AS BASE POLYMERS FOR RESIST MATERIALS FOR AN EXPOSURE LIGHT SOURCE OF A SHORT WAVELENGTH | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2002-10-08 | — | — | US | disclosed |
| US-20020102493-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-01 | — | — | US | disclosed |
| US-20020091215-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-11 | — | — | US | disclosed |
| US-20020009667-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| US-20010033989-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |