Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 2/20 | 0.67 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.40 |
| ▸ | TSHR | P16473 | 4/20 | 0.40 |
| ▸ | SRC | P12931 | 1/20 | 0.40 |
| ▸ | AKT1 | P31749 | 2/20 | 0.38 |
| ▸ | HTT | P42858 | 2/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | NPC1 | O15118 | 2/20 | 0.35 |
| ▸ | RAB9A | P51151 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL274928 | 0.91 | CES1 (0.56) | CES1ALDH1A1TSHRSRCAKT1 | |
| SCHEMBL5598169 | 0.82 | CES1 (0.75) | CES1ALDH1A1TSHRSRCHTT | |
| Formaldehyde SCHEMBL1128921 | 0.81 | CES1 (0.93) | CES1ALDH1A1TSHRSRCCYP3A4 | |
| Formaldehyde SCHEMBL28114609 | 0.81 | CES1 (0.93) | CES1ALDH1A1TSHRSRCCYP3A4 | |
| SCHEMBL28324796 | 0.81 | CES1 (0.93) | CES1ALDH1A1TSHRSRCCYP3A4 | |
| SCHEMBL12852163 | 0.81 | CES1 (0.46) | CES1ALDH1A1TSHRSRCAKT1 | |
| Acrylic Acid SCHEMBL9640960 | 0.81 | CES1 (0.73) | CES1ALDH1A1TSHRSRCAKT1 | |
| SCHEMBL1679763 | 0.81 | CES1 (1.00) | CES1ALDH1A1TSHRSRCKMT2A | |
| SCHEMBL15173 | 0.81 | CES1 (1.00) | CES1ALDH1A1TSHRSRCKMT2A | |
| Methoxymethane SCHEMBL28719477 | 0.80 | CES1 (0.96) | CES1ALDH1A1TSHRSRCKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0234463-B1 | PHOTOPOLYMERISABLE MOULDING COMPOSITIONS CONTAINING METALLIC WIRE INSERTS | BASF Aktiengesellschaft (DE) | 1991-03-13 | — | — | EP | disclosed |
| EP-0162572-B1 | SILOXANE POLYPHOTOINITIATORS OF THE SUBSTITUTED ACETOPHENONE TYPE | LOCTITE CORPORATION (US) | 1989-01-25 | — | — | EP | disclosed |
| EP-0234463-A1 | Photopolymerisable moulding compositions containing metallic wire inserts | BASF Aktiengesellschaft (DE) | 1987-09-02 | — | — | EP | disclosed |
| EP-0072918-B1 | PHOTOPOLYMERISABLE RECORDING MATERIAL AND PROCESS FOR THE PRODUCTION OF RELIEF FORMS BY MEANS OF THIS RECORDING MATERIAL | BASF Aktiengesellschaft (DE) | 1986-12-17 | — | — | EP | disclosed |
| EP-0162572-A1 | Siloxane polyphotoinitiators of the substituted acetophenone type | LOCTITE CORPORATION (US) | 1985-11-27 | — | — | EP | disclosed |
| US-4534838-A | Siloxane polyphotoinitiators of the substituted acetophenone type | LOCTITE CORPORATION (US) | 1985-08-13 | — | — | US | disclosed |
| EP-0054150-B1 | PHOTOPOLYMERISABLE RECORDING MATERIAL AND PROCESS FOR THE PRODUCTION OF RELIEF FORMS BY MEANS OF THIS RECORDING MATERIAL | BASF Aktiengesellschaft (DE) | 1984-05-09 | — | — | EP | disclosed |
| EP-0054151-B1 | PHOTOPOLYMERISABLE RECORDING MATERIAL AND PROCESS FOR THE PRODUCTION OF RELIEF FORMS BY MEANS OF THIS RECORDING MATERIAL | BASF Aktiengesellschaft (DE) | 1984-01-04 | — | — | EP | disclosed |
| EP-0072918-A1 | Photopolymerisable recording material and process for the production of relief forms by means of this recording material | BASF Aktiengesellschaft (DE) | 1983-03-02 | — | — | EP | disclosed |
| EP-0054151-A1 | Photopolymerisable recording material and process for the production of relief forms by means of this recording material | BASF Aktiengesellschaft (DE) | 1982-06-23 | — | — | EP | disclosed |
| EP-0054150-A1 | Photopolymerisable recording material and process for the production of relief forms by means of this recording material | BASF Aktiengesellschaft (DE) | 1982-06-23 | — | — | EP | disclosed |
| US-4287367-A | Manufacture of symmetrical or unsymmetrical monoacetals of aromatic 1,2-diketones | BASF AKTIENGESELLSCHAFT (DE) | 1981-09-01 | — | — | US | disclosed |
| EP-0023634-A1 | Process for producing shaped articles from unsaturated polyester resins | BASF Aktiengesellschaft (DE) | 1981-02-11 | — | — | EP | disclosed |
| US-4144156-A | Manufacture of unsymmetric monoacetals of aromatic 1,2-diketones employable as photoiniatiators | BASF AKTIENGESELLSCHAFT (DE) | 1979-03-13 | — | — | US | disclosed |