Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC1A3 | P43003 | 4/20 | 0.56 |
| ▸ | SLC1A2 | P43004 | 4/20 | 0.56 |
| ▸ | SLC1A1 | P43005 | 3/20 | 0.56 |
| ▸ | CA2 | P00918 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | FOLH1 | Q04609 | 2/20 | 0.43 |
| ▸ | NAALAD2 | Q9Y3Q0 | 2/20 | 0.43 |
| ▸ | ENPEP | Q07075 | 2/20 | 0.43 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.42 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.42 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.42 |
| ▸ | HTR2A | P28223 | 1/20 | 0.42 |
| ▸ | HTR2C | P28335 | 1/20 | 0.42 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.42 |
| ▸ | HRH1 | P35367 | 1/20 | 0.42 |
| ▸ | DRD3 | P35462 | 1/20 | 0.42 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.42 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.42 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL164389 | 1.00 | SLC1A3 (0.56) | SLC1A3SLC1A2SLC1A1CA2MAPK1 | |
| SCHEMBL15677327 | 1.00 | SLC1A3 (0.56) | SLC1A3SLC1A2SLC1A1CA2MAPK1 | |
| SCHEMBL14703124 | 1.00 | SLC1A3 (0.56) | SLC1A3SLC1A2SLC1A1CA2MAPK1 | |
| SCHEMBL12630685 | 1.00 | SLC1A3 (0.56) | SLC1A3SLC1A2SLC1A1CA2MAPK1 | |
| SCHEMBL9750996 | 1.00 | SLC1A3 (0.56) | SLC1A3SLC1A2SLC1A1CA2MAPK1 | |
| SCHEMBL17131773 | 1.00 | SLC1A3 (0.56) | SLC1A3SLC1A2SLC1A1CA2MAPK1 | |
| SCHEMBL117765 | 0.98 | SLC1A3 (0.58) | SLC1A3SLC1A2SLC1A1CA2MAPK1 | |
| SCHEMBL13377666 | 0.90 | SLC1A3 (0.50) | SLC1A3SLC1A2SLC1A1FOLH1NAALAD2 | |
| SCHEMBL11615292 | 0.90 | SLC1A3 (0.50) | SLC1A3SLC1A2SLC1A1FOLH1NAALAD2 | |
| SCHEMBL14998130 | 0.90 | SLC1A3 (0.50) | SLC1A3SLC1A2SLC1A1FOLH1NAALAD2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170247334-A1 | IMIDAZOLE COMPOUND, METAL SURFACE TREATMENT LIQUID, METAL SURFACE TREATMENT METHOD, AND LAMINATE PRODUCTION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-08-31 | — | — | US | disclosed |
| US-9557651-B2 | Chemically amplified positive-type photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-01-31 | — | — | US | disclosed |
| US-9389505-B2 | Polymerizable composition for solder resist, and solder resist pattern formation method | FUJIFILM CORPORATION (JP) | 2016-07-12 | — | — | US | disclosed |
| US-9372403-B2 | Chemically amplified photosensitive resin composition and method for producing resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-06-21 | — | — | US | disclosed |
| US-9323152-B2 | Chemically amplified positive-type photosensitive resin composition and method for producing resist pattern using the same | TOKYO OHKA KOGYO CO., LTD (JP) | 2016-04-26 | — | — | US | disclosed |
| US-9244354-B2 | Method for producing thick film photoresist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | disclosed |
| US-20150268553-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-24 | — | — | US | disclosed |
| US-9091916-B2 | Positive-type photoresist composition, photoresist laminate, method for producing photoresist pattern, and method for producing connecting terminal | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20150056557-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN USING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-26 | — | — | US | disclosed |
| US-20150044613-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN USING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-12 | — | — | US | disclosed |
| US-20130034812-A1 | POLYMERIZABLE COMPOSITION FOR SOLDER RESIST, AND SOLDER RESIST PATTERN FORMATION METHOD | FUJIFILM CORPORATION (JP) | 2013-02-07 | — | — | US | disclosed |
| US-20120141940-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM, AND METHOD FOR PRODUCING THICK FILM RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170247334-A1 | IMIDAZOLE COMPOUND, METAL SURFACE TREATMENT LIQUID, METAL SURFACE TREATMENT METHOD, AND LAMINATE PRODUCTION METHOD | FASN, SLC27A1, SLC27A2 | SLC1A3 295/4885SLC1A2 228/4885SLC1A1 626/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.