⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methyl Alcohol SCHEMBL27867972 | 0.93 | — | — | |
| Methyl Alcohol SCHEMBL6401310 | 0.93 | CAMK2A (0.56) | — | |
| SCHEMBL28580 | 0.93 | — | — | |
| SCHEMBL21114358 | 0.93 | CAMK2A (0.62) | — | |
| Acetic Acid SCHEMBL9008818 | 0.90 | LMNA (0.53) | — | |
| Acetic Acid SCHEMBL2124440 | 0.90 | LMNA (0.53) | — | |
| Acetic Acid SCHEMBL5395207 | 0.90 | LMNA (0.53) | — | |
| Acetic Acid SCHEMBL8526392 | 0.90 | LMNA (0.53) | — | |
| Acetic Acid SCHEMBL4069322 | 0.90 | LMNA (0.53) | — | |
| Acetic Acid SCHEMBL5379107 | 0.90 | LMNA (0.53) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 314 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024100183-A1 | LIQUID CRYSTALLINE SAM VIA SPIN-COAT ASSEMBLY AND THEIR AREA SELECTIVE DEPOSITION PROPERTIES | MERCK PATENT GMBH (DE) | 2024-05-16 | — | — | WO | claimed |
| WO-2024100181-A1 | DSA OF LIQUID CRYSTAL BLOCK COPOLYMERS FOR INTEGRATED CIRCUIT PATTERNING | MERCK PATENT GMBH (DE) | 2024-05-16 | — | — | WO | claimed |
| US-10155879-B2 | Compositions and use thereof for modification of substrate surfaces | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2018-12-18 | — | — | US | claimed |
| EP-4399197-A1 | SELECTIVE SELF-ASSEMBLED MONOLAYERS VIA SPIN-COATING METHOD FOR USE IN DSA | Merck Patent GmbH (DE) | 2024-07-17 | — | — | EP | disclosed |
| CN-111837075-B | Negative super thick film photoresist | 默克专利股份有限公司 | 2024-07-05 | — | — | CN | disclosed |
| US-20240219829-A1 | HYDROPHOBIC CROSSLINKABLE PINNING UNDERLAYERS WITH IMPROVED DRY ETCH CAPABILITIES FOR PATTERNING DIRECTED SELF-ASSEMBLY OF PS-B-PMMA TYPE BLOCK COPOLYMERS | MERCK PATENT GMBH (DE) | 2024-07-04 | — | — | US | disclosed |
| EP-4388021-A2 | DEVELOPMENT OF NOVEL HYDROPHILIC PINNING MAT | Merck Patent GmbH (DE) | 2024-06-26 | — | — | EP | disclosed |
| WO-2024100183-A1 | LIQUID CRYSTALLINE SAM VIA SPIN-COAT ASSEMBLY AND THEIR AREA SELECTIVE DEPOSITION PROPERTIES | MERCK PATENT GMBH (DE) | 2024-05-16 | — | — | WO | disclosed |
| WO-2024100181-A1 | DSA OF LIQUID CRYSTAL BLOCK COPOLYMERS FOR INTEGRATED CIRCUIT PATTERNING | MERCK PATENT GMBH (DE) | 2024-05-16 | — | — | WO | disclosed |
| CN-117923503-A | Hollow structure silicon dioxide dispersion liquid with aldehyde groups grafted on inner and outer surfaces and preparation method thereof | 山东国瓷功能材料股份有限公司 | 2024-04-26 | — | — | CN | disclosed |
| EP-4341310-A1 | HYDROPHOBIC CROSSLINKABLE PINNING UNDERLAYERS WITH IMPROVED DRY ETCH CAPABILITIES FOR PATTERNING DIRECTED SELF-ASSEMBLY OF PS-B-PMMA TYPE BLOCK COPOLYMERS | Merck Patent GmbH (DE) | 2024-03-27 | — | — | EP | disclosed |
| US-5945516-A | PRIOR TO ESTERIFICATION OF THE POLYHYDROXY PHENOL WITH THE NAPHTHOQUINONE DIAZIDE SULFONYL HALIDE, THE REACTANTS ARE INITIALLY DISSOLVED IN AN APROTIC SOLVENT TOGETHER WITH STRONG BASE; NONPRECIPITATING, FOR FORMATION OF PHOTORESISTS | SHIPLEY COMPANY, L.L.C. (US) | 1999-08-31 | — | — | US | disclosed |
| US-5932389-A | PHENOLIC RESIN | SHIPLEY COMPANY, L.L.C. (US) | 1999-08-03 | — | — | US | disclosed |
| US-5821345-A | DISSOLVING WITH A STRONG BASE AND APROTIC SOLVENT; ESTER INTERCHANGE | SHIPLEY COMPANY, L.L.C. (US) | 1998-10-13 | — | — | US | disclosed |
| US-5723254-A | NOVOLAK ESTERIFIED WITH O-NAPHTHOQUINONE DIAZIDE | SHIPLEY COMPANY, L.L.C. (US) | 1998-03-03 | — | — | US | disclosed |
| US-5589553-A | PHOTORESISTS | SHIPLEY COMPANY, L.L.C. (US) | 1996-12-31 | — | — | US | disclosed |
| EP-0737895-A1 | Photoresist with photoactive compound mixtures | Shipley Company LLC (US) | 1996-10-16 | — | — | EP | disclosed |
| EP-0735425-A2 | Esterification product of aromatic novolak resin with quinone diazide sulfonyl compound | Shipley Company LLC (US) | 1996-10-02 | — | — | EP | disclosed |
| EP-0735424-A2 | Photoresist with photoactive compound mixtures | Shipley Company LLC (US) | 1996-10-02 | — | — | EP | disclosed |
| US-5529880-A | NOVOLAK RESINS | SHIPLEY COMPANY, L.L.C. (US) | 1996-06-25 | — | — | US | disclosed |