SCHEMBL9891725

SCHEMBL9891725

CCCC[Si](C)(C)O[Si](C)(C)CCCN1C(=O)c2ccc(C(c3ccc4c(c3)C(=O)N(C)C4=O)(C(F)(F)F)C(F)(F)F)cc2C1=O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 9/20 0.40
▸ MEN1 O00255 4/20 0.40
▸ KMT2A Q03164 4/20 0.40
▸ HPGD P15428 2/20 0.40
▸ USP2 O75604 2/20 0.40
▸ TSHR P16473 1/20 0.40
▸ CASP1 P29466 1/20 0.40
▸ RECQL P46063 1/20 0.40
▸ CASP7 P55210 1/20 0.40
▸ TDP1 Q9NUW8 1/20 0.40
▸ MAPK1 P28482 4/20 0.36
▸ HSD17B10 Q99714 2/20 0.36
▸ L3MBTL1 Q9Y468 2/20 0.36
▸ MAPT P10636 2/20 0.36
▸ KDM4E B2RXH2 3/20 0.34
▸ HTT P42858 1/20 0.34
▸ CA1 P00915 1/20 0.33
▸ CA2 P00918 1/20 0.33
▸ CA4 P22748 1/20 0.33
▸ CA9 Q16790 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13038059 0.95 ALDH1A1 (0.38) ALDH1A1MEN1KMT2AHPGDUSP2
SCHEMBL12432391 0.89 ALDH1A1 (0.34) ALDH1A1MEN1KMT2AHPGDUSP2
SCHEMBL15248753 0.87 ALDH1A1 (0.33) ALDH1A1MEN1KMT2AHPGDUSP2
SCHEMBL10260048 0.87 ALDH1A1 (0.47) ALDH1A1MEN1KMT2AHPGDUSP2
SCHEMBL17618253 0.85 ALDH1A1 (0.32) ALDH1A1MEN1KMT2AHPGDUSP2
SCHEMBL18680399 0.83 CA9 (0.34) ALDH1A1MEN1KMT2AHPGDUSP2
SCHEMBL13411197 0.81 ALDH1A1 (0.54) ALDH1A1MEN1KMT2AHPGDUSP2
SCHEMBL14408046 0.80 ALDH1A1 (0.55) ALDH1A1MEN1KMT2AUSP2TSHR
SCHEMBL18054798 0.79 — —
SCHEMBL15233564 0.78 ALDH1A1 (0.47) ALDH1A1MEN1KMT2AHPGDUSP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120139131-A1 WAFER MOLD MATERIAL AND METHOD FOR MANUFACTURING SEMICONDUCTOR APPARATUS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-07 — — US disclosed
US-7678874-B2 Polyimide having an alcoholic hydroxyl group and a process for the preparation thereof SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-16 — — US disclosed
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