Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | TET2 | Q6N021 | 4/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TET3 | O43151 | 1/20 | 0.33 |
| ▸ | TET1 | Q8NFU7 | 1/20 | 0.33 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.33 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.33 |
| ▸ | LCK | P06239 | 1/20 | 0.33 |
| ▸ | FYN | P06241 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL18139615 | 0.91 | TP53 (0.42) | TP53TDP1TSHRTET2ALDH1A1 | |
| Methacrylic Acid SCHEMBL18140193 | 0.91 | TP53 (0.42) | TP53TDP1TSHRTET2ALDH1A1 | |
| Methacrylic Acid SCHEMBL18139336 | 0.91 | TP53 (0.42) | TP53TDP1TSHRTET2ALDH1A1 | |
| Methacrylic Acid SCHEMBL5179645 | 0.91 | TP53 (0.42) | TP53TDP1TSHRTET2ALDH1A1 | |
| Methacrylic Acid SCHEMBL5177458 | 0.91 | TP53 (0.42) | TP53TDP1TSHRTET2ALDH1A1 | |
| Methacrylic Acid SCHEMBL18140661 | 0.91 | TP53 (0.42) | TP53TDP1TSHRTET2ALDH1A1 | |
| Methacrylic Acid SCHEMBL9779318 | 0.91 | TP53 (0.42) | TP53TDP1TSHRTET2ALDH1A1 | |
| Methacrylic Acid SCHEMBL18139800 | 0.91 | TP53 (0.42) | TP53TDP1TSHRTET2ALDH1A1 | |
| Methacrylic Acid SCHEMBL18139409 | 0.91 | TP53 (0.42) | TP53TDP1TSHRTET2ALDH1A1 | |
| Methacrylic Acid SCHEMBL5179642 | 0.91 | TP53 (0.42) | TP53TDP1TSHRTET2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114245881-A | Photosensitive resin composition | 日产化学株式会社 | 2022-03-25 | — | — | CN | disclosed |
| CN-114174351-A | Resin composition | 日产化学株式会社 | 2022-03-11 | — | — | CN | disclosed |
| CN-104854509-B | Coating liquid for forming inorganic oxide coating film, and display device | 日产化学工业株式会社 | 2021-04-13 | — | — | CN | disclosed |
| CN-112639618-A | Negative photosensitive resin composition | 日产化学株式会社 | 2021-04-09 | — | — | CN | disclosed |
| WO-2021024928-A1 | RESIN COMPOSITION | 日産化学株式会社 | 2021-02-11 | — | — | WO | disclosed |
| CN-105765458-B | Negative photosensitive resin composition | 日产化学工业株式会社 | 2020-12-29 | — | — | CN | disclosed |
| CN-111684358-A | Photosensitive resin composition | 日产化学株式会社 | 2020-09-18 | — | — | CN | disclosed |
| WO-2020044918-A1 | NEGATIVE-WORKING PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2020-03-05 | — | — | WO | disclosed |
| CN-110573963-A | Photosensitive resin composition | 日产化学株式会社 | 2019-12-13 | — | — | CN | disclosed |
| CN-104641294-B | Negative light-sensitive resin combination | 日产化学工业株式会社 | 2019-08-23 | — | — | CN | disclosed |
| WO-2019156000-A1 | PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2019-08-15 | — | — | WO | disclosed |
| CN-104641294-A | Negative photosensitive resin composition | NISSAN CHEMICAL IND LTD | 2015-05-20 | — | — | CN | disclosed |
| US-8968857-B2 | High hardness imprint material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-20120148809-A1 | HIGH HARDNESS IMPRINT MATERIAL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-14 | — | — | US | disclosed |