Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.31 |
| ▸ | BLM | P54132 | 1/20 | 0.31 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.30 |
| ▸ | CDC25B | P30305 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9908334 | 0.84 | — | — | |
| SCHEMBL17070165 | 0.80 | MEN1 (0.39) | MEN1CYP3A4ALOX15KMT2ALMNA | |
| SCHEMBL804669 | 0.79 | MEN1 (0.42) | MEN1CYP3A4ALOX15KMT2ALMNA | |
| SCHEMBL21453077 | 0.79 | MEN1 (0.42) | MEN1CYP3A4ALOX15KMT2ALMNA | |
| SCHEMBL14984029 | 0.77 | LMNA (0.38) | MEN1CYP3A4ALOX15KMT2ALMNA | |
| SCHEMBL1191595 | 0.76 | LMNA (0.41) | MEN1CYP3A4ALOX15KMT2ALMNA | |
| SCHEMBL26501077 | 0.76 | LMNA (0.41) | MEN1CYP3A4ALOX15KMT2ALMNA | |
| SCHEMBL9908446 | 0.75 | MEN1 (0.39) | MEN1CYP3A4ALOX15KMT2ALMNA | |
| SCHEMBL19545639 | 0.75 | MEN1 (0.39) | MEN1CYP3A4ALOX15KMT2ALMNA | |
| SCHEMBL12736702 | 0.75 | MEN1 (0.39) | MEN1CYP3A4ALOX15KMT2ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |