SCHEMBL9908343

SCHEMBL9908343

CC(COC(=O)C1CC2CCC1C2)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.41
EPHX2 P34913 2/20 0.38
HSD11B1 P28845 1/20 0.38
HPGD P15428 2/20 0.34
L3MBTL1 Q9Y468 2/20 0.34
NPC1 O15118 2/20 0.34
RAB9A P51151 2/20 0.34
ALDH1A1 P00352 2/20 0.34
MAPT P10636 1/20 0.34
MAPK1 P28482 1/20 0.34
GFER P55789 1/20 0.34
KCNQ3 O43525 1/20 0.33
KCNQ2 O43526 1/20 0.33
KCNQ4 P56696 1/20 0.33
KCNQ5 Q9NR82 1/20 0.33
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
TSHR P16473 1/20 0.32
SLC6A3 Q01959 1/20 0.32
HSD17B10 Q99714 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17070168 0.88 POLB (0.41) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL13923785 0.84 POLB (0.41) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL13477402 0.81 POLB (0.40) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL21853767 0.81 POLB (0.47) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL2625622 0.81 POLB (0.41) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL13080639 0.80 EPHX2 (0.39) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL31178057 0.79 POLB (0.49) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL1862636 0.79 POLB (0.49) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL2625625 0.78 POLB (0.40) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL10134892 0.78 POLB (0.40) POLBEPHX2HSD11B1HPGDL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8198016-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-12 US disclosed
US-20090286188-A1 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-19 US disclosed