SCHEMBL9908394

SCHEMBL9908394

CN(C)S(=O)(=O)CC1CC2CCC1C2

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
NPC1 O15118 1/20 0.38
RAB9A P51151 1/20 0.38
SCN9A Q15858 2/20 0.37
CYP3A4 P08684 1/20 0.36
MEP1B Q16820 1/20 0.36
PER2 O15055 1/20 0.33
CRY1 Q16526 1/20 0.33
CRY2 Q49AN0 1/20 0.33
POLB P06746 1/20 0.33
MAPT P10636 1/20 0.33
HTT P42858 2/20 0.33
LMNA P02545 2/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
HIF1A Q16665 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17023955 0.79 MEN1 (0.38) MEN1KMT2ANPC1RAB9ASCN9A
SCHEMBL482737 0.75
SCHEMBL13005302 0.75 INPP5A (0.47) MEN1KMT2ANPC1RAB9ASCN9A
SCHEMBL9908406 0.74 MEN1 (0.39) MEN1KMT2ANPC1RAB9ASCN9A
Hydrochloric Acid SCHEMBL7988308 0.73 MEN1 (0.38) MEN1KMT2ANPC1RAB9APOLB
SCHEMBL11837746 0.70 MAPT (0.38) MEN1KMT2ANPC1RAB9AMEP1B
SCHEMBL21568884 0.69 MEN1 (0.41) MEN1KMT2ANPC1RAB9AMEP1B
SCHEMBL10835600 0.68 NPC1 (0.42) MEN1KMT2ANPC1RAB9APOLB
SCHEMBL10284382 0.67 MEN1 (0.53) MEN1KMT2ANPC1RAB9APOLB
SCHEMBL14094820 0.67 MEN1 (0.53) MEN1KMT2ANPC1RAB9APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9448482-B2 Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2016-09-20 US disclosed
US-20150253673-A1 PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-09-10 US disclosed
US-8198016-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-12 US disclosed
US-20090286188-A1 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-19 US disclosed