SCHEMBL9908416

SCHEMBL9908416

CC1(C)OCC(COC(=O)C2CC3CCC2C3)O1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 2/20 0.42
TP53 P04637 1/20 0.39
CYP3A4 P08684 1/20 0.39
POLB P06746 1/20 0.36
HSD11B1 P28845 1/20 0.34
KCNQ3 O43525 1/20 0.33
KCNQ2 O43526 1/20 0.33
KCNQ4 P56696 1/20 0.33
KCNQ5 Q9NR82 1/20 0.33
TMEM97 Q5BJF2 2/20 0.32
SIGMAR1 Q99720 2/20 0.32
HTR7 P34969 1/20 0.32
TSHR P16473 1/20 0.31
ALDH1A1 P00352 3/20 0.31
HPGD P15428 2/20 0.31
NPSR1 Q6W5P4 1/20 0.31
HSD17B10 Q99714 1/20 0.31
NPC1 O15118 1/20 0.31
MAPT P10636 1/20 0.31
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27759088 0.81 TP53 (0.60) TP53CYP3A4POLBHSD11B1KCNQ3
SCHEMBL20349636 0.75 CA2 (0.50) CA2TP53CYP3A4TMEM97SIGMAR1
SCHEMBL1922788 0.74 CA2 (0.53) CA2TP53CYP3A4TMEM97SIGMAR1
SCHEMBL6943821 0.74 CA2 (0.56) CA2TP53CYP3A4TMEM97SIGMAR1
SCHEMBL6575404 0.74 CA2 (0.56) CA2TP53CYP3A4TMEM97SIGMAR1
SCHEMBL461346 0.74 CA2 (0.56) CA2TP53CYP3A4TMEM97SIGMAR1
SCHEMBL18395904 0.74 CA2 (0.56) CA2TP53CYP3A4TMEM97SIGMAR1
SCHEMBL22654022 0.73 CA2 (0.41) CA2TP53CYP3A4POLBHTR7
SCHEMBL11764163 0.73 EPHX1 (0.44) CA2TP53CYP3A4ALDH1A1NPSR1
SCHEMBL15225887 0.73 CA2 (0.54) CA2TP53CYP3A4TMEM97SIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9448482-B2 Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2016-09-20 US disclosed
US-20150253673-A1 PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-09-10 US disclosed
US-8198016-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-12 US disclosed
US-20090286188-A1 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-19 US disclosed