Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | IL1B | P01584 | 1/20 | 0.31 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9908414 | 0.84 | MEN1 (0.31) | MEN1NPC1RAB9AKMT2AIL1B | |
| SCHEMBL2991139 | 0.76 | MEN1 (0.37) | MEN1NPC1RAB9AKMT2AP2RX7 | |
| SCHEMBL13374665 | 0.72 | MEN1 (0.35) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL2998400 | 0.71 | MEN1 (0.38) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL19135933 | 0.69 | MEN1 (0.33) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL24885348 | 0.69 | — | — | |
| SCHEMBL15147149 | 0.69 | CHRM5 (0.34) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL2988153 | 0.69 | MEN1 (0.38) | MEN1NPC1RAB9AKMT2AP2RX7 | |
| SCHEMBL25233759 | 0.65 | MEN1 (0.41) | MEN1NPC1RAB9AKMT2AP2RX7 | |
| SCHEMBL22590372 | 0.64 | KDM4E (0.36) | MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9448482-B2 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-20150253673-A1 | PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |