Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14528550 | 0.78 | ALDH1A1 (0.36) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL14355134 | 0.76 | TSHR (0.45) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL9908409 | 0.75 | HPGD (0.34) | MEN1KMT2ANPC1RAB9AHPGD | |
| SCHEMBL2988153 | 0.75 | MEN1 (0.38) | MEN1KMT2ANPC1RAB9AHPGD | |
| SCHEMBL2991139 | 0.73 | MEN1 (0.37) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL9908421 | 0.72 | MEN1 (0.32) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL25233759 | 0.71 | MEN1 (0.41) | MEN1KMT2ANPC1RAB9AHPGD | |
| SCHEMBL3001215 | 0.70 | MEN1 (0.35) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL2996232 | 0.68 | MEN1 (0.34) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL2998400 | 0.68 | MEN1 (0.38) | MEN1KMT2ANPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117946148-A | IVB metal complex, preparation method and application thereof | 万华化学集团股份有限公司 | 2024-04-30 | — | — | CN | disclosed |
| CN-104788926-B | Polyalkylene carbonate resin composition | SK新技术株式会社 | 2020-07-24 | — | — | CN | disclosed |
| US-20160009946-A1 | UNDER LAYER FILM-FORMING COMPOSITION FOR IMPRINTS AND METHOD FOR FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| US-8288072-B2 | Antireflection film; fast etching speed whcih reduces deformation; accuracy; 2,3-epoxypropyl methacrylate ester-styrene copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| US-7687228-B2 | Antireflection film composition and patterning process using the same | SHIN ETSU CHEMICAL CO., LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-20080227037-A1 | Resist lower layer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080220381-A1 | Antireflection film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-11 | — | — | US | disclosed |