Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.40 |
| ▸ | MEN1 | O00255 | 3/20 | 0.40 |
| ▸ | POLB | P06746 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11296271 | 0.83 | HPGD (0.42) | HPGDLMNASMN1; SMN2ALDH1A1KMT2A | |
| SCHEMBL32688617 | 0.79 | ALDH1A1 (0.48) | HPGDLMNASMN1; SMN2ALDH1A1KMT2A | |
| SCHEMBL32688870 | 0.77 | HPGD (0.51) | HPGDLMNASMN1; SMN2ALDH1A1KMT2A | |
| SCHEMBL16900287 | 0.77 | HPGD (0.40) | HPGDLMNASMN1; SMN2ALDH1A1KMT2A | |
| SCHEMBL19655056 | 0.75 | HPGD (0.41) | HPGDLMNASMN1; SMN2ALDH1A1KMT2A | |
| SCHEMBL6773057 | 0.74 | ALDH1A1 (0.40) | HPGDLMNASMN1; SMN2ALDH1A1KMT2A | |
| SCHEMBL6772422 | 0.74 | ALDH1A1 (0.43) | HPGDLMNASMN1; SMN2ALDH1A1KMT2A | |
| SCHEMBL16900481 | 0.73 | HPGD (0.37) | HPGDLMNASMN1; SMN2ALDH1A1KMT2A | |
| SCHEMBL18535794 | 0.73 | HPGD (0.40) | HPGDLMNASMN1; SMN2ALDH1A1KMT2A | |
| SCHEMBL32689198 | 0.73 | HPGD (0.47) | HPGDLMNASMN1; SMN2ALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9448482-B2 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-20150253673-A1 | PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |