SCHEMBL9908975

SCHEMBL9908975

CC(C)(O)COC(=O)c1c2ccccc2cc2ccccc12

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.52
HPGD P15428 6/20 0.52
KDM4E B2RXH2 5/20 0.52
MEN1 O00255 3/20 0.52
KMT2A Q03164 3/20 0.52
L3MBTL1 Q9Y468 2/20 0.52
GLA P06280 2/20 0.47
CYP1A2 P05177 1/20 0.47
CYP2C19 P33261 1/20 0.47
HSD17B10 Q99714 1/20 0.47
TDP1 Q9NUW8 2/20 0.46
MAPK1 P28482 2/20 0.46
LMNA P02545 1/20 0.46
MAPT P10636 1/20 0.46
ATM Q13315 1/20 0.46
POLB P06746 1/20 0.41
GABRP O00591 1/20 0.40
GABRD O14764 1/20 0.40
GABRA1 P14867 1/20 0.40
GABRB1 P18505 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21561700 0.85 ALDH1A1 (0.50) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL3399044 0.85 ALDH1A1 (0.50) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL5835576 0.80 CA12 (0.55) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL13159643 0.80 ALDH1A1 (0.51) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL1164214 0.78 KDM4E (0.55) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL6880564 0.78 ALDH1A1 (0.56) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL12133336 0.77 KDM4E (0.54) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL482475 0.77 ALDH1A1 (0.53) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL14406095 0.77 ALDH1A1 (0.54) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL12016477 0.77 KDM4E (0.54) ALDH1A1HPGDKDM4EMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8822138-B2 Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-09-02 US disclosed
EP-2469338-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING RESIN HAVING ALIPHATIC RING AND AROMATIC RING Nissan Chemical Industries, Ltd. (JP) 2012-06-27 EP disclosed
US-20120142195-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR LITHOGRAPHY INCLUDING RESIN CONTAINING ALICYCLIC RING AND AROMATIC RING NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-06-07 US disclosed