Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Histamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Histamine SCHEMBL2279 | 0.98 | — | — | |
| Histamine SCHEMBL1668636 | 0.98 | HRH4 (0.42) | — | |
| Histamine SCHEMBL27340939 | 0.98 | — | — | |
| Histamine SCHEMBL289072 | 0.98 | HRH4 (0.42) | — | |
| Histamine SCHEMBL7444650 | 0.98 | HRH4 (0.42) | — | |
| Histamine SCHEMBL5447892 | 0.98 | — | — | |
| Histamine SCHEMBL23926389 | 0.96 | HRH4 (0.38) | — | |
| Histamine SCHEMBL6453806 | 0.95 | — | — | |
| Histamine SCHEMBL584026 | 0.95 | TDP1 (0.44) | — | |
| Histamine SCHEMBL931130 | 0.95 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7294528-B2 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2007-11-13 | — | — | US | claimed |
| US-7030168-B2 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2006-04-18 | — | — | US | claimed |
| US-20050181613-A1 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | ADVANCED TECHNOLOGY MATERIALS, INC. | 2005-08-18 | — | — | US | claimed |
| WO-2003058680-A2 | SUPERCRITICAL FLUID-ASSISTED DEPOSITION OF MATERIALS ON SEMICONDUCTOR SUBSTRATES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-07-17 | — | — | WO | claimed |
| US-20030124785-A1 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | ATMI, INC. | 2003-07-03 | — | — | US | claimed |
| US-8546276-B2 | Deposition of group IV metal-containing films at high temperature | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2013-10-01 | — | — | US | disclosed |
| US-20120175751-A1 | DEPOSITION OF GROUP IV METAL-CONTAINING FILMS AT HIGH TEMPERATURE | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2012-07-12 | — | — | US | disclosed |
| WO-2011007323-A1 | DEPOSITION OF GROUP IV METAL-CONTAINING FILMS AT HIGH TEMPERATURE | L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2011-01-20 | — | — | WO | disclosed |