SCHEMBL9917199

SCHEMBL9917199

CCCCCC[N+](C)(C)CC(=O)O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.58
DNM1 Q05193 8/20 0.56
KMT2A Q03164 2/20 0.54
HSP90AA1 P07900 2/20 0.52
RAD52 P43351 2/20 0.52
PLA2G1B P04054 1/20 0.48
ATG4B Q9Y4P1 1/20 0.48
PPARG P37231 3/20 0.48
PPARD Q03181 3/20 0.48
PPARA Q07869 3/20 0.48
TSHR P16473 2/20 0.48
GPR84 Q9NQS5 2/20 0.48
HDAC11 Q96DB2 2/20 0.48
TDP1 Q9NUW8 2/20 0.48
ALDH1A1 P00352 1/20 0.48
SLC22A6 Q4U2R8 1/20 0.48
SLC22A8 Q8TCC7 1/20 0.48
TLR2 O60603 1/20 0.48
MEN1 O00255 1/20 0.48
ESR1 P03372 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14589612 1.00 HTT (0.58) HTTDNM1KMT2AHSP90AA1RAD52
SCHEMBL8586568 1.00 HTT (0.58) HTTDNM1KMT2AHSP90AA1RAD52
SCHEMBL8439979 1.00 HTT (0.58) HTTDNM1KMT2AHSP90AA1RAD52
SCHEMBL901713 1.00 HTT (0.58) HTTDNM1KMT2AHSP90AA1RAD52
SCHEMBL8438524 1.00 HTT (0.58) HTTDNM1KMT2AHSP90AA1RAD52
SCHEMBL308046 1.00 HTT (0.58) HTTDNM1KMT2AHSP90AA1RAD52
SCHEMBL1537860 1.00 HTT (0.58) HTTDNM1KMT2AHSP90AA1RAD52
SCHEMBL308688 1.00 HTT (0.58) HTTDNM1KMT2AHSP90AA1RAD52
SCHEMBL8773947 1.00 HTT (0.58) HTTDNM1KMT2AHSP90AA1RAD52
SCHEMBL14589610 1.00 HTT (0.58) HTTDNM1KMT2AHSP90AA1RAD52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9632410-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device FUJIFILM CORPORATION (JP) 2017-04-25 US disclosed
US-9632410-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device FUJIFILM CORPORATION (JP) 2017-04-25 US disclosed
US-20160033868-A1 METHOD FOR PRODUCING A PLANOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2016-02-04 US disclosed
US-20160018732-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, PHOTOMASK AND PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-01-21 US disclosed
US-9223216-B2 Lithographic printing plate precursor and method of preparing the same FUJIFILM CORPORATION (JP) 2015-12-29 US disclosed
US-9091926-B2 Method of making planographic printing plate and planographic printing plate FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9067401-B2 Process for making lithographic printing plate and lithographic printing plate FUJIFILM CORPORATION (JP) 2015-06-30 US disclosed
US-9046774-B2 Positive-working lithographic printing plate precursor for infrared laser and process for making lithographic printing plate FUJIFILM CORPORATION (JP) 2015-06-02 US disclosed
US-20150093692-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM USED THEREFOR, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAMEDEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAME FUJIFILM CORPORATION (JP) 2015-04-02 US disclosed
US-20150093692-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM USED THEREFOR, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAMEDEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAME FUJIFILM CORPORATION (JP) 2015-04-02 US disclosed
US-20110156317-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING STARTING PLATE FOR LASER ENGRAVING, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2011-06-30 US disclosed
US-20110159439-A1 THERMALLY CROSSLINKABLE RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND RELIEF PRINTING PLATE AND PROCESS FOR MAKING SAME FUJIFILM CORPORATION (JP) 2011-06-30 US disclosed
US-20110156318-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND RELIEF PRINTING PLATE AND PROCESS FOR MAKING SAME FUJIFILM CORPORATION (JP) 2011-06-30 US disclosed
US-20110159438-A1 THERMALLY CROSSLINKABLE RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING STARTING PLATE FOR LASER ENGRAVING AND PROCESS FOR PRODUCING THE SAME, AND RELIEF PRINTING PLATE AND PROCESS FOR MAKING SAME FUJIFILM CORPORATION (JP) 2011-06-30 US disclosed
US-20110146516-A1 METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2011-06-23 US disclosed
US-20110076613-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND METHOD FOR PRODUCING THE SAME, AND RELIEF PRINTING PLATE AND METHOD FOR MAKING THE SAME FUJIFILM CORPORATION (JP) 2011-03-31 US disclosed
US-20090148792-A1 METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING PLATE PRECURSOR FUJIFILM CORPORATION (JP) 2009-06-11 US disclosed
US-20080261153-A1 PLATE MAKING METHOD OF LITHOGRAPHIC PRINTING PLATE PRECURSOR FUJIFILM CORPORATION (JP) 2008-10-23 US disclosed
WO-2007147222-A9 NOVEL IONIC LIQUIDS UNIV LEUVEN KATH (BE) 2008-02-14 WO disclosed
WO-2007147222-A2 NOVEL IONIC LIQUIDS KATHOLIEKE UNIVERSITEIT LEUVEN (BE) 2007-12-27 WO disclosed