SCHEMBL9925213

SCHEMBL9925213

CCC(C)(C)C(=O)OC1C2CCC(C2)C1OC(=O)NC

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CHRM1 P11229 1/20 0.34
HMGCR P04035 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9925214 0.82 ATM (0.33) HMGCR
SCHEMBL12202162 0.82
SCHEMBL25701420 0.81 HMGCR (0.34) HMGCR
SCHEMBL9925216 0.81 PPM1B (0.31) CHRM1
SCHEMBL17857904 0.81 HMGCR (0.30) HMGCR
SCHEMBL25701418 0.80 HMGCR (0.33) HMGCR
SCHEMBL13201518 0.80 HMGCR (0.35) HMGCR
SCHEMBL9925212 0.79 DPP4 (0.30) HMGCR
SCHEMBL20101400 0.79 HMGCR (0.33) HMGCR
SCHEMBL9925207 0.78 EPHX1 (0.41) CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8987386-B2 Method of producing polymeric compound, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-03-24 US disclosed
US-8658343-B2 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2014-02-25 US disclosed
US-20120328993-A1 METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-12-27 US disclosed
US-20120148953-A1 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2012-06-14 US disclosed