SCHEMBL9925207

SCHEMBL9925207

CCC(C)(C)C(=O)OC1CCC(OC(=O)NC)CC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 2/20 0.41
NAAA Q02083 1/20 0.35
CHRM1 P11229 2/20 0.34
KCNA3 P22001 1/20 0.32
CHRM3 P20309 2/20 0.32
MLNR O43193 1/20 0.32
CHRM2 P08172 1/20 0.32
HTR2A P28223 1/20 0.32
HTR2C P28335 1/20 0.32
HRH1 P35367 1/20 0.32
OPRM1 P35372 1/20 0.32
DRD3 P35462 1/20 0.32
OPRK1 P41145 1/20 0.32
HTR2B P41595 1/20 0.32
SLC6A3 Q01959 1/20 0.32
KCNH2 Q12809 1/20 0.32
CACNA1C Q13936 1/20 0.32
FKBP1A P62942 3/20 0.32
CYP19A1 P11511 1/20 0.31
SMN1; SMN2 Q16637 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3434648 0.88 EPHX1 (0.37) EPHX1NAAACHRM1CHRM3MLNR
SCHEMBL18119952 0.81 FKBP1A (0.34) EPHX1NAAACHRM1CHRM3MLNR
SCHEMBL2625659 0.81 APOBEC3A (0.36) EPHX1NAAACHRM1CHRM3MLNR
SCHEMBL2754858 0.81 CHRM3 (0.34) EPHX1NAAACHRM1CHRM3MLNR
SCHEMBL132269 0.81 CYP19A1 (0.40) EPHX1CHRM1CHRM3MLNRCHRM2
SCHEMBL2625661 0.81 CHRM3 (0.34) EPHX1NAAACHRM1CHRM3MLNR
SCHEMBL3435204 0.80 EPHX1 (0.43) EPHX1NAAACHRM1CHRM3MLNR
SCHEMBL132134 0.80 EPHX1 (0.47) EPHX1NAAACHRM1CHRM3MLNR
SCHEMBL103736 0.80
SCHEMBL10810342 0.80 EPHX1 (0.47) EPHX1NAAACHRM1KCNA3SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8987386-B2 Method of producing polymeric compound, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-03-24 US disclosed
US-8658343-B2 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2014-02-25 US disclosed
US-20120328993-A1 METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-12-27 US disclosed
US-20120148953-A1 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2012-06-14 US disclosed