SCHEMBL9930262

SCHEMBL9930262

[CH2]C(C)C(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL270744 0.80
SCHEMBL9383004 0.80
SCHEMBL210425 0.78
SCHEMBL212534 0.78
SCHEMBL15676 0.78
SCHEMBL9387476 0.74
SCHEMBL29278224 0.74
SCHEMBL82506 0.72
SCHEMBL39601 0.70
SCHEMBL20797028 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012171872-A2 EMULSION-TYPE COSMETIC COMPOSITION FOR COATING KERATIN FIBRES, AND PROCESS FOR COATING KERATIN FIBRES L'OREAL (FR) 2012-12-20 WO claimed
CN-101906089-B Lactone compound SHANGHAI INST ORGANIC CHEM 2012-01-25 CN claimed
CN-101906089-A Lactone compound SHANGHAI INST ORGANIC CHEM 2010-12-08 CN claimed
CN-101104689-A Organic polysiloxane used for water-based system defoaming GOLDSCHMIDT AG TH (DE) 2008-01-16 CN claimed
WO-2024095926-A1 CLEANING LIQUID AND SUBSTRATE CLEANING METHOD 東京応化工業株式会社 2024-05-10 WO disclosed
WO-2023099242-A1 AQUEOUS CARE AND/OR MAKEUP COMPOSITION COMPRISING A FATTY ACID MONOESTER, A NEUTRALIZED ANIONIC SURFACTANT, A VP/EICOSENE COPOLYMER AND A DYESTUFF L'OREAL (FR) 2023-06-08 WO disclosed
WO-2023099241-A1 AQUEOUS CARE AND/OR MAKEUP COMPOSITION COMPRISING A FATTY ACID MONOESTER, A NEUTRALIZED ANIONIC SURFACTANT, A VP/EICOSENE COPOLYMER, A SEMICRYSTALLINE POLYMER AND A LATEX L'OREAL (FR) 2023-06-08 WO disclosed
US-20230174892-A1 DETERGENT COMPOSITION AND CHEMICAL-MECHANICAL POLISHING COMPOSITION DAICEL CORPORATION (JP) 2023-06-08 US disclosed
CN-115516073-A Cleaning agent composition and chemical mechanical polishing composition 株式会社大赛璐 2022-12-23 CN disclosed
WO-2021095398-A1 ORGANIC AMMONIUM SALT AND HYDROGEN BOND MATERIAL TREATING AGENT USING SAME ミヨシ油脂株式会社 2021-05-20 WO disclosed
US-10597616-B2 Cleaning liquid and method for manufacturing the same TOYOTA OHKA KOGYO CO., LTD. (JP) 2020-03-24 US disclosed
US-10597609-B2 Cleaning liquid, anticorrosion agent, and method for manufacturing the same TOKYO OHKA KOGYO CO., LTD. (JP) 2020-03-24 US disclosed
CN-101104689-A Organic polysiloxane used for water-based system defoaming GOLDSCHMIDT AG TH (DE) 2008-01-16 CN disclosed
CN-1247689-C Ultraviolet-curable resin composition TAIYO INK MFG CO LTD (JP) 2006-03-29 CN disclosed
CN-1139634-C Solidifiable composition based on polymer containing free carboxy ���׿ƹɷ����޹�˾ 2004-02-25 CN disclosed
CN-1376178-A Ultraviolet-curable resin composition TAIYO INK MFG CO LTD (JP) 2002-10-23 CN disclosed
CN-1285755-A Sterilization wrap, applications therefor, and method of sterilizing KIMBERLY CLARK CO (US) 2001-02-28 CN disclosed
CN-1045972-C Process for improving impact resistance of coated plastic substrates SDC COATINGS INC (US) 1999-10-27 CN disclosed
CN-1201051-A Solidifiable composition based on polymer containing free carboxy CIBA GEIGY AG (CH) 1998-12-09 CN disclosed
CN-1115989-A Method for improving impact resistance of coated plastic substrates SDC COATINGS INC (US) 1996-01-31 CN disclosed