SCHEMBL9938856

SCHEMBL9938856

CCCCCCCCCCCCCCCCCCCCF

nearest known ligand 0.61

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.61
THRB P10828 1/20 0.61
DNM1 Q05193 9/20 0.53
ALDH1A1 P00352 3/20 0.53
MEN1 O00255 2/20 0.53
KMT2A Q03164 2/20 0.53
EPHX1 P07099 1/20 0.53
LMNA P02545 2/20 0.44
HSD17B10 Q99714 1/20 0.44
SLC22A1 O15245 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4892627 1.00 TSHR (0.61) TSHRTHRBDNM1ALDH1A1MEN1
SCHEMBL45326 1.00 TSHR (0.61) TSHRTHRBDNM1ALDH1A1MEN1
SCHEMBL294511 1.00
SCHEMBL19221488 1.00 TSHR (0.61) TSHRTHRBDNM1ALDH1A1MEN1
SCHEMBL10608047 1.00 TSHR (0.61) TSHRTHRBDNM1ALDH1A1MEN1
SCHEMBL113425 1.00 TSHR (0.61) TSHRTHRBDNM1ALDH1A1MEN1
SCHEMBL30108 1.00
SCHEMBL7198783 1.00 TSHR (0.61) TSHRTHRBDNM1ALDH1A1MEN1
SCHEMBL20966349 1.00 TSHR (0.61) TSHRTHRBDNM1ALDH1A1MEN1
SCHEMBL1425429 1.00 TSHR (0.61) TSHRTHRBDNM1ALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117897440-A Method for screening solvent for extraction of polyvinyl chloride, method for recycling waste material, recycled polyvinyl chloride and composition 株式会社LG化学 2024-04-16 CN claimed
CN-117897439-A Method for screening solvent for extraction of polyvinyl chloride, method for recovering waste material, and recovered polyvinyl chloride and composition 株式会社LG化学 2024-04-16 CN claimed
EP-2652753-B1 DIELECTRIC INSULATION MEDIUM ABB TECHNOLOGY AG (CH) 2015-08-26 EP claimed
EP-2652751-B1 DIELECTRIC INSULATION MEDIUM ABB RESEARCH LTD (CH) 2015-02-25 EP claimed
US-8709303-B2 Dielectric insulation medium ABB RESEARCH LTD. (CH) 2014-04-29 US claimed
EP-2652753-A1 DIELECTRIC INSULATION MEDIUM ABB Technology AG (CH) 2013-10-23 EP claimed
EP-2652751-A1 DIELECTRIC INSULATION MEDIUM ABB Research Ltd. (CH) 2013-10-23 EP claimed
US-20130265692-A1 Dielectric Insulation Medium ABB RESEARCH LTD. (CH) 2013-10-10 US claimed
US-20130221292-A1 Dielectric Insulation Medium ABB TECHNOLOGY AG (CH) 2013-08-29 US claimed
WO-2012080222-A1 DIELECTRIC INSULATION MEDIUM ABB RESEARCH LTD (CH) 2012-06-21 WO claimed
WO-2012080269-A1 DIELECTRIC INSULATION MEDIUM ABB TECHNOLOGY AG (CH) 2012-06-21 WO claimed
CN-116323272-B Thermal conditioning of batteries by immersion in liquid compositions 阿科玛法国公司 2026-05-19 CN disclosed
CN-118973549-A Compositions suitable for high oil content 莱雅公司 2024-11-15 CN disclosed
CN-118900679-A Cosmetic composition comprising a particulate cellulose compound, hydrophobic silica aerogel particles, a semi-crystalline polymer and a wax of vegetable origin 欧莱雅公司 2024-11-05 CN disclosed
CN-118871078-A Cosmetic or dermatological composition comprising at least a merocyanine and a hydrotrope 欧莱雅 2024-10-29 CN disclosed
US-20130265692-A1 Dielectric Insulation Medium ABB RESEARCH LTD. (CH) 2013-10-10 US disclosed
US-20130221292-A1 Dielectric Insulation Medium ABB TECHNOLOGY AG (CH) 2013-08-29 US disclosed
WO-2012080269-A1 DIELECTRIC INSULATION MEDIUM ABB TECHNOLOGY AG (CH) 2012-06-21 WO disclosed
WO-2012080222-A1 DIELECTRIC INSULATION MEDIUM ABB RESEARCH LTD (CH) 2012-06-21 WO disclosed
CN-1920666-A Photosensitive slurry SUMITOMO CHEMICAL CO (JP) 2007-02-28 CN disclosed