Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FOLH1 | Q04609 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.46 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | CA1 | P00915 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | CA4 | P22748 | 1/20 | 0.43 |
| ▸ | CA6 | P23280 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL16531812 | 1.00 | FOLH1 (0.53) | FOLH1ALDH1A1ALOX15TSHRKMT2A | |
| Benzene SCHEMBL27083018 | 0.98 | FOLH1 (0.55) | FOLH1ALDH1A1ALOX15TSHRKMT2A | |
| SCHEMBL89060 | 0.98 | FOLH1 (0.55) | FOLH1ALDH1A1ALOX15TSHRKMT2A | |
| Phosphine SCHEMBL28264956 | 0.96 | FOLH1 (0.53) | FOLH1ALDH1A1ALOX15TSHRKMT2A | |
| SCHEMBL11094883 | 0.96 | FOLH1 (0.53) | FOLH1ALDH1A1ALOX15TSHRKMT2A | |
| Hydrochloric Acid SCHEMBL7974299 | 0.96 | FOLH1 (0.53) | FOLH1ALDH1A1ALOX15TSHRKMT2A | |
| Potassium SCHEMBL16531822 | 0.96 | FOLH1 (0.53) | FOLH1ALDH1A1ALOX15TSHRKMT2A | |
| SCHEMBL4333779 | 0.94 | FOLH1 (0.52) | FOLH1ALDH1A1ALOX15TSHRKMT2A | |
| SCHEMBL3805421 | 0.89 | AKR1C3 (0.48) | FOLH1ALDH1A1ALOX15TSHRKMT2A | |
| SCHEMBL474921 | 0.86 | GABRA1 (0.47) | FOLH1ALDH1A1TSHRKMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9862914-B2 | Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2018-01-09 | — | — | US | disclosed |
| US-9845538-B2 | Etching agent, etching method and etching agent preparation liquid | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9803161-B2 | Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-31 | — | — | US | disclosed |
| EP-3051577-B1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | WAKO PURE CHEM IND LTD (JP) | 2017-10-18 | — | — | EP | disclosed |
| US-20160272924-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2016-09-22 | — | — | US | disclosed |
| EP-3051577-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | Wako Pure Chemical Industries, Ltd. (JP) | 2016-08-03 | — | — | EP | disclosed |
| US-20160177457-A1 | ETCHING AGENT, ETCHING METHOD AND ETCHING AGENT PREPARATION LIQUID | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2016-06-23 | — | — | US | disclosed |
| EP-2475000-B1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | WAKO PURE CHEM IND LTD (JP) | 2015-07-01 | — | — | EP | disclosed |
| US-20150140820-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-05-21 | — | — | US | disclosed |
| US-9034810-B2 | Processing agent composition for semiconductor surface and method for processing semiconductor surface using same | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-05-19 | — | — | US | disclosed |
| US-9006164-B2 | Resist remover composition and method for removing resist using the composition | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-04-14 | — | — | US | disclosed |
| EP-2843689-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | Wako Pure Chemical Industries, Ltd. (JP) | 2015-03-04 | — | — | EP | disclosed |
| EP-2474862-B1 | COMPOSITION FOR REMOVING A RESIST ON A SEMICONDUCTOR SUBSTRATE AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | WAKO PURE CHEM IND LTD (JP) | 2015-02-25 | — | — | EP | disclosed |
| EP-2475000-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | Wako Pure Chemical Industries, Ltd. (JP) | 2012-07-11 | — | — | EP | disclosed |
| EP-2474862-A1 | RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2012-07-11 | — | — | EP | disclosed |
| US-20120172274-A1 | RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120157368-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-21 | — | — | US | disclosed |
| EP-0355228-A1 | Enzymic agent for washing, degreasing and water reconditioning | TUKOVY PRUMYSL, KONCERN (CS) | 1990-02-28 | — | — | EP | disclosed |