Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOD1 | Q9Y239 | 2/20 | 0.57 |
| ▸ | ITGB3 | P05106 | 1/20 | 0.48 |
| ▸ | ITGA2B | P08514 | 1/20 | 0.48 |
| ▸ | FOLH1 | Q04609 | 2/20 | 0.48 |
| ▸ | RIMKLA | Q8IXN7 | 1/20 | 0.47 |
| ▸ | NAALAD2 | Q9Y3Q0 | 1/20 | 0.47 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.45 |
| ▸ | GGH | Q92820 | 1/20 | 0.45 |
| ▸ | PLA2G10 | O15496 | 1/20 | 0.44 |
| ▸ | PLA2G2C | Q5R387 | 1/20 | 0.44 |
| ▸ | PPARG | P37231 | 6/20 | 0.44 |
| ▸ | PPARD | Q03181 | 6/20 | 0.44 |
| ▸ | PPARA | Q07869 | 6/20 | 0.44 |
| ▸ | GPR84 | Q9NQS5 | 5/20 | 0.44 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.44 |
| ▸ | TSHR | P16473 | 4/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | TLR2 | O60603 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | FABP4 | P15090 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27908769 | 0.98 | NOD1 (0.59) | NOD1ITGB3ITGA2BFOLH1PLA2G10 | |
| SCHEMBL27945784 | 0.98 | NOD1 (0.59) | NOD1ITGB3ITGA2BFOLH1PLA2G10 | |
| SCHEMBL45655 | 0.98 | NOD1 (0.58) | NOD1ITGB3ITGA2BFOLH1RIMKLA | |
| SCHEMBL1325387 | 0.98 | NOD1 (0.58) | NOD1ITGB3ITGA2BFOLH1RIMKLA | |
| SCHEMBL45656 | 0.98 | NOD1 (0.58) | NOD1ITGB3ITGA2BFOLH1RIMKLA | |
| SCHEMBL25244619 | 0.97 | NOD1 (0.60) | NOD1ITGB3ITGA2BFOLH1PLA2G10 | |
| SCHEMBL2721132 | 0.97 | NOD1 (0.60) | NOD1ITGB3ITGA2BFOLH1PLA2G10 | |
| SCHEMBL2721131 | 0.97 | NOD1 (0.60) | NOD1ITGB3ITGA2BFOLH1PLA2G10 | |
| SCHEMBL8383011 | 0.97 | NOD1 (0.60) | NOD1ITGB3ITGA2BFOLH1PLA2G10 | |
| SCHEMBL8383009 | 0.97 | NOD1 (0.60) | NOD1ITGB3ITGA2BFOLH1PLA2G10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9862914-B2 | Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2018-01-09 | — | — | US | disclosed |
| EP-3051577-B1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | WAKO PURE CHEM IND LTD (JP) | 2017-10-18 | — | — | EP | disclosed |
| US-20160272924-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2016-09-22 | — | — | US | disclosed |
| EP-3051577-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | Wako Pure Chemical Industries, Ltd. (JP) | 2016-08-03 | — | — | EP | disclosed |
| EP-2475000-B1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | WAKO PURE CHEM IND LTD (JP) | 2015-07-01 | — | — | EP | disclosed |
| US-9034810-B2 | Processing agent composition for semiconductor surface and method for processing semiconductor surface using same | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-05-19 | — | — | US | disclosed |
| US-9006164-B2 | Resist remover composition and method for removing resist using the composition | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-04-14 | — | — | US | disclosed |
| EP-2474862-B1 | COMPOSITION FOR REMOVING A RESIST ON A SEMICONDUCTOR SUBSTRATE AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | WAKO PURE CHEM IND LTD (JP) | 2015-02-25 | — | — | EP | disclosed |
| EP-2475000-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | Wako Pure Chemical Industries, Ltd. (JP) | 2012-07-11 | — | — | EP | disclosed |
| EP-2474862-A1 | RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2012-07-11 | — | — | EP | disclosed |
| US-20120172274-A1 | RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120157368-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-21 | — | — | US | disclosed |