Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | GRIK1 | P39086 | 2/20 | 0.31 |
| ▸ | GRIK2 | Q13002 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | CPA1 | P15085 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL88777 | 0.98 | CYP2C19 (0.34) | CYP2C19GRIK1GRIK2ALDH1A1TSHR | |
| SCHEMBL131348 | 0.97 | CYP2C19 (0.33) | CYP2C19GRIK1GRIK2ALDH1A1TSHR | |
| Ammonia Solution, Strong SCHEMBL7197487 | 0.97 | CYP2C19 (0.33) | CYP2C19GRIK1GRIK2ALDH1A1TSHR | |
| SCHEMBL7968681 | 0.97 | CYP2C19 (0.33) | CYP2C19GRIK1GRIK2ALDH1A1TSHR | |
| Ammonia Solution, Strong SCHEMBL7197485 | 0.97 | CYP2C19 (0.33) | CYP2C19GRIK1GRIK2ALDH1A1TSHR | |
| SCHEMBL3373613 | 0.86 | HTT (0.31) | GRIK1GRIK2 | |
| SCHEMBL29249896 | 0.82 | CYP2C19 (0.30) | CYP2C19 | |
| SCHEMBL29249995 | 0.82 | CYP2C19 (0.30) | CYP2C19 | |
| SCHEMBL1115344 | 0.81 | CHRM1 (0.32) | — | |
| SCHEMBL1115579 | 0.79 | HSPD1 (0.38) | ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114846183-B | Heater coating agent for false twist machine | 竹本油脂株式会社 | 2023-12-01 | — | — | CN | disclosed |
| CN-114846183-A | Heater coating agent for false twist processing machine | 竹本油脂株式会社 | 2022-08-02 | — | — | CN | disclosed |
| EP-2475000-B1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | WAKO PURE CHEM IND LTD (JP) | 2015-07-01 | — | — | EP | disclosed |
| US-9034810-B2 | Processing agent composition for semiconductor surface and method for processing semiconductor surface using same | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-05-19 | — | — | US | disclosed |
| US-9006164-B2 | Resist remover composition and method for removing resist using the composition | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-04-14 | — | — | US | disclosed |
| EP-2474862-B1 | COMPOSITION FOR REMOVING A RESIST ON A SEMICONDUCTOR SUBSTRATE AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | WAKO PURE CHEM IND LTD (JP) | 2015-02-25 | — | — | EP | disclosed |
| EP-2475000-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | Wako Pure Chemical Industries, Ltd. (JP) | 2012-07-11 | — | — | EP | disclosed |
| EP-2474862-A1 | RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2012-07-11 | — | — | EP | disclosed |
| US-20120172274-A1 | RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120157368-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-21 | — | — | US | disclosed |
| US-4883586-A | INCREASING THE RECOVERY OF MINERAL VALUES USING A COLUMN FLOT-ATION UNIT CELL | J. R. SIMPLOT CO. (US) | 1989-11-28 | — | — | US | disclosed |