SCHEMBL9945609

SCHEMBL9945609

COC(=O)c1ccc2c(C)cc(C)nc2c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 7/20 0.52
GAA P10253 2/20 0.52
KMT2A Q03164 2/20 0.50
POLB P06746 1/20 0.50
MEN1 O00255 1/20 0.50
HPGD P15428 1/20 0.50
RXFP1 Q9HBX9 1/20 0.50
MAPT P10636 2/20 0.49
TDP1 Q9NUW8 2/20 0.49
CSNK2A1 P68400 2/20 0.49
MITF O75030 1/20 0.49
ALDH1A1 P00352 4/20 0.48
MAPK1 P28482 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
TP53 P04637 1/20 0.48
LCK P06239 1/20 0.48
TSHR P16473 1/20 0.47
HSD17B10 Q99714 1/20 0.47
HTT P42858 2/20 0.47
ALOX15 P16050 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20271627 0.88 GAA (0.62) KDM4EGAAKMT2APOLBMEN1
SCHEMBL30049700 0.88 GAA (0.62) KDM4EGAAKMT2APOLBMEN1
SCHEMBL19764532 0.86 GAA (0.54) KDM4EGAAKMT2APOLBMEN1
SCHEMBL29893824 0.85 CSNK2A1 (0.53) KDM4ECSNK2A1ALDH1A1L3MBTL1TP53
SCHEMBL25894686 0.85 CSNK2A1 (0.53) KDM4ECSNK2A1ALDH1A1L3MBTL1TP53
SCHEMBL20504366 0.85 TP53 (0.55) KDM4EGAAKMT2AMEN1HPGD
SCHEMBL9944367 0.84 NPC1 (0.57) KDM4EKMT2APOLBMEN1MAPT
SCHEMBL31175317 0.82 CYP1A2 (0.55) KDM4EGAAKMT2APOLBMEN1
SCHEMBL21816246 0.82 CYP1A2 (0.55) KDM4EGAAKMT2APOLBMEN1
SCHEMBL27185326 0.79 KDM4E (0.60) KDM4EGAAKMT2AMEN1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846291-B2 Resist composition, method of forming resist pattern, and new compound TOKYO OHKA KOGYO CO. LTD. (JP) 2014-09-30 US disclosed
US-20120148955-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2012-06-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120148955-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND C1R, SLC11A2, RER1 KDM4E 4730/4885GAA 4381/4885KMT2A 3398/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.