⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1271146 | 0.75 | — | — | |
| SCHEMBL5395187 | 0.75 | — | — | |
| SCHEMBL709033 | 0.75 | — | — | |
| SCHEMBL62640 | 0.75 | — | — | |
| SCHEMBL15186 | 0.72 | MEN1 (0.33) | — | |
| SCHEMBL37587 | 0.72 | MEN1 (0.33) | — | |
| SCHEMBL554739 | 0.72 | MEN1 (0.33) | — | |
| SCHEMBL424207 | 0.71 | — | — | |
| SCHEMBL727620 | 0.71 | — | — | |
| SCHEMBL9301843 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8999621-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2015-04-07 | — | — | US | disclosed |
| US-20120148957-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-06-14 | — | — | US | disclosed |