Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL3 | Q96JM7 | 9/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 8/20 | 0.43 |
| ▸ | MBTD1 | Q05BQ5 | 5/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | TP53BP1 | Q12888 | 1/20 | 0.37 |
| ▸ | L3MBTL4 | Q8NA19 | 1/20 | 0.37 |
| ▸ | HRH3 | Q9Y5N1 | 3/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14802764 | 0.98 | L3MBTL3 (0.42) | L3MBTL3L3MBTL1MBTD1CYP2D6CYP2C19 | |
| SCHEMBL12706415 | 0.80 | SMN1; SMN2 (0.40) | L3MBTL3L3MBTL1ALDH1A1 | |
| SCHEMBL25820253 | 0.77 | L3MBTL3 (0.39) | L3MBTL3L3MBTL1ALDH1A1HRH3 | |
| SCHEMBL29332707 | 0.76 | HRH3 (0.33) | L3MBTL3L3MBTL1CYP2D6CYP2C19ALDH1A1 | |
| SCHEMBL23542683 | 0.74 | L3MBTL3 (0.47) | L3MBTL3L3MBTL1MBTD1ALDH1A1TP53BP1 | |
| SCHEMBL18951849 | 0.74 | MAPK1 (0.42) | L3MBTL3L3MBTL1MBTD1CYP2D6CYP2C19 | |
| SCHEMBL12107951 | 0.73 | L3MBTL3 (0.41) | L3MBTL3L3MBTL1MBTD1TP53BP1L3MBTL4 | |
| SCHEMBL529229 | 0.73 | — | — | |
| SCHEMBL26112589 | 0.73 | L3MBTL3 (0.52) | L3MBTL3L3MBTL1MBTD1CYP2D6CYP2C19 | |
| SCHEMBL26117153 | 0.73 | L3MBTL3 (0.52) | L3MBTL3L3MBTL1MBTD1CYP2D6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8999621-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2015-04-07 | — | — | US | disclosed |
| US-20150093692-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM USED THEREFOR, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAMEDEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2015-04-02 | — | — | US | disclosed |
| US-8841060-B2 | Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2014-09-23 | — | — | US | disclosed |
| US-20130004740-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20120148957-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-06-14 | — | — | US | disclosed |