SCHEMBL9947155

SCHEMBL9947155

CC(C)(C)S(=O)(=O)C(F)(F)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA7 P43166 1/20 0.35
CA13 Q8N1Q1 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20228521 0.81
SCHEMBL2607862 0.81 CA1 (0.35) CA1CA2CA7CA13
SCHEMBL24685503 0.81 CA1 (0.35) CA1CA2CA7CA13
SCHEMBL5634477 0.80 CA1 (0.39) CA1CA2CA7CA13
SCHEMBL776245 0.79 CA2 (0.44) CA1CA2CA7CA13
SCHEMBL2125173 0.76 CA2 (0.41) CA1CA2CA7CA13
SCHEMBL13822435 0.75 CA1 (0.35) CA1CA2CA7CA13
SCHEMBL14256896 0.73 CA1 (0.32) CA1CA2CA7CA13
Lithium SCHEMBL30354992 0.73 CA1 (0.33) CA1CA2CA7CA13
SCHEMBL12308961 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119340518-A Lithium secondary battery and assembly 大金工业株式会社 2025-01-21 CN disclosed
CN-113261140-B Electrolyte for lithium ion secondary battery, and assembly 大金工业株式会社 2024-12-13 CN disclosed
CN-114008824-B Alkali metal electrode treatment agent, electrolyte for alkali metal secondary battery, alkali metal electrode, alkali metal secondary battery, and module 大金工业株式会社 2024-11-08 CN disclosed
CN-113498562-B Electrolyte, electrochemical device, and electronic device 宁德新能源科技有限公司 2024-09-03 CN disclosed
CN-113508485-B Electrolyte, electrochemical device, lithium ion secondary battery, and assembly 大金工业株式会社 2024-08-20 CN disclosed
CN-113490674-B Compound, additive for electrolyte, electrochemical device, lithium ion secondary battery, and module 大金工业株式会社 2024-06-07 CN disclosed
US-20240128511-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE BATTERY USING SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2024-04-18 US disclosed
US-11942601-B2 Nonaqueous electrolyte solution and nonaqueous electrolyte battery using same MITSUBISHI CHEMICAL CORPORATION (JP) 2024-03-26 US disclosed
WO-2024010057-A1 NEGATIVE ELECTRODE, BATTERY, AND METHOD FOR COVERING BATTERY MATERIAL ダイキン工業株式会社 2024-01-11 WO disclosed
WO-2024010056-A1 SECONDARY BATTERY ダイキン工業株式会社 2024-01-11 WO disclosed
EP-2535976-B1 NON-AQUEOUS ELECTROLYTE SOLUTION, AND SECONDARY BATTERY COMPRISING THE SAME MITSUBISHI CHEM CORP (JP) 2015-09-02 EP disclosed
US-8673489-B2 Nonaqueous electrolytic solution and nonaqeuous-electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2014-03-18 US disclosed
US-20130280622-A1 NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2013-10-24 US disclosed
US-20130084493-A1 NONAQUEOUS-ELECTROLYTE BATTERIES AND NONAQUEOUS ELECTROLYTIC SOLUTIONS MITSUBISHI CHEMICAL CORPORATION (JP) 2013-04-04 US disclosed
EP-2535976-A1 NONAQUEOUS ELECTROLYTE SOLUTION, AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY Mitsubishi Chemical Corporation (JP) 2012-12-19 EP disclosed
US-20120308881-A1 NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQEUOUS-ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2012-12-06 US disclosed
US-20120244425-A1 NONAQUEOUS-ELECTROLYTE BATTERIES AND NONAQUEOUS ELECTROLYTIC SOLUTIONS MITSUBISHI CHEMICAL CORPORATION (JP) 2012-09-27 US disclosed
EP-2485316-A1 NONAQUEOUS ELECTROLYTE BATTERY AND NONAQUEOUS ELECTROLYTE SOLUTION Mitsubishi Chemical Corporation (JP) 2012-08-08 EP disclosed
US-20120148957-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2012-06-14 US disclosed
US-20110143280-A1 POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2011-06-16 US disclosed