Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH3 | Q9Y5N1 | 3/20 | 0.42 |
| ▸ | CARM1 | Q86X55 | 1/20 | 0.38 |
| ▸ | PRMT6 | Q96LA8 | 1/20 | 0.38 |
| ▸ | PRMT8 | Q9NR22 | 1/20 | 0.38 |
| ▸ | HTR2A | P28223 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1459032 | 1.00 | HRH3 (0.42) | HRH3CARM1PRMT6PRMT8HTR2A | |
| SCHEMBL12802639 | 0.98 | HRH3 (0.41) | HRH3CARM1PRMT6PRMT8HTR2A | |
| SCHEMBL12581088 | 0.93 | HRH3 (0.37) | HRH3CARM1PRMT6PRMT8POLB | |
| SCHEMBL1229250 | 0.87 | HRH3 (0.50) | HRH3POLBMEN1ALDH1A1MAPT | |
| SCHEMBL614666 | 0.87 | HRH3 (0.50) | HRH3POLBMEN1ALDH1A1MAPT | |
| SCHEMBL329772 | 0.84 | HRH3 (0.46) | HRH3CARM1PRMT6PRMT8POLB | |
| SCHEMBL1230445 | 0.80 | HRH3 (0.41) | HRH3CARM1PRMT6PRMT8HTR2A | |
| SCHEMBL1459382 | 0.78 | HRH3 (0.39) | HRH3CARM1PRMT6PRMT8POLB | |
| SCHEMBL12802541 | 0.78 | TDP1 (0.44) | ALDH1A1 | |
| SCHEMBL4058397 | 0.78 | MEN1 (0.42) | POLBMEN1ALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10040947-B2 | Primer composition | MITSUI CHEMICALS, INC. (JP) | 2018-08-07 | — | — | US | disclosed |
| US-9587042-B2 | Process for producing modified conjugated diene-based polymer, modified conjugated diene-based polymer, and polymer composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-03-07 | — | — | US | disclosed |
| US-8933165-B2 | Method for producing modified conjugated diene-based polymer, and method for producing polymer composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-01-13 | — | — | US | disclosed |
| US-20140088242-A1 | METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE-BASED POLYMER, AND METHOD FOR PRODUCING POLYMER COMPOSITION | ZEON CORPORATION (JP) | 2014-03-27 | — | — | US | disclosed |
| US-8658346-B2 | Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-25 | — | — | US | disclosed |
| CN-101952381-B | Primer composition | MITSUI CHEMICALS INC | 2013-08-14 | — | — | CN | disclosed |
| US-8426105-B2 | Resist-modifying composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-23 | — | — | US | disclosed |
| US-8367310-B2 | Pattern forming process and resist-modifying composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| US-8329384-B2 | Resist-modifying composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-11 | — | — | US | disclosed |
| US-20120252966-A1 | PROCESS FOR PRODUCING MODIFIED CONJUGATED DIENE-BASED POLYMER, MODIFIED CONJUGATED DIENE-BASED POLYMER, AND POLYMER COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED | 2012-10-04 | — | — | US | disclosed |
| EP-2258780-A1 | PRIMER COMPOSITION | Mitsui Chemicals, Inc. (JP) | 2010-12-08 | — | — | EP | disclosed |
| US-20100297554-A1 | RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100297563-A1 | RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100209849-A1 | PATTERN FORMING PROCESS AND RESIST-MODIFYING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
| US-20100159392-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100086878-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| EP-1245585-B1 | Hydrogenated modified polymer, process for producing the same and composition containing the same | JSR CORP (JP) | 2008-05-21 | — | — | EP | disclosed |
| US-6838538-B2 | Hydrogenated modified polymer, process for producing the same and composition containing the same | JSR CORPORATION (JP) | 2005-01-04 | — | — | US | disclosed |
| US-20030100683-A1 | Hydrogenated modified polymer, process for producing the same and composition containing the same | JSR CORPORATION (JP) | 2003-05-29 | — | — | US | disclosed |
| EP-1245585-A2 | Hydrogenated modified polymer, process for producing the same and composition containing the same | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |